Fast and precise measurements of the two-dimensional birefringence distribution in microlithographic lens materials

Henning T. Katte

doi:10.1117/12.846366

15 April 2010 Fast and precise measurements of the two-dimensional birefringence distribution in microlithographic lens materials

Henning T. Katte

Author Affiliations +

Proceedings Volume 7638, Metrology, Inspection, and Process Control for Microlithography XXIV; 763834 (2010) https://doi.org/10.1117/12.846366
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

Highly homogeneous glasses and crystalline materials such as CaF₂ are used in high-end microlithographic applications. Residual stresses in the material lead to stress birefringence and thus to imaging errors, which is undesirable for semiconductor manufacture in view of the ever smaller structure sizes. In order to meet the increasing requirements regarding repeatability, lateral resolution and measuring speed, a new type of automated imaging polarimeter has been developed. The measuring apparatus determines the two-dimensional stress birefringence distribution within a large field of view at a high lateral resolution. The short measuring time enables a high sample throughput and makes it possible to analyze time- and temperature-dependent alterations.

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Henning T. Katte "Fast and precise measurements of the two-dimensional birefringence distribution in microlithographic lens materials", Proc. SPIE 7638, Metrology, Inspection, and Process Control for Microlithography XXIV, 763834 (15 April 2010); https://doi.org/10.1117/12.846366

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