Paper
10 September 2010 Preparation and investigation of diamond-like carbon nanocomposite thin films for nanophotonics
Zh. Panosyan, A. Gharibyan, A. Sargsyan, H. Panosyan, D. Hayrapetyan, Y. Yengibaryan
Author Affiliations +
Abstract
Flexible Plasma Enhanced Chemical Vapor Deposition (PECVD) technology of Diamond Like Carbon (DLC) thin film preparation on the surface of Si and organic glasses has been elaborated. Modification of PECVD equipment has been implemented by integrating ion and magnetron sources. In this paper toluene (C7H8) has been used as a nanocmposite film forming hydrocarbon which decomposition yields to the multi component plasma in vacuum chamber. Nitrogen has been used as a dopand. Investigation of plasma composition influence to the optical and mechanical properties of DLC films has been observed. The presence of sp3 and sp2 hybridization states have been proven by Raman spectroscopy and their ratios have been estimated with the help of ID, IG characteristic lines for different technological conditions. High precision refractive index and thickness measurements of DLC films have been implemented by means of laser ellipsometer. Refractive indices of prepared films have been varied in the region 1.5-3.1 and thicknesses have been varied in the region 50-250 nm. Extraordinary change in refractive index has been explained with the help of formation of differently sized sp2 carbon based clusters in the sp3 matrix. Different types of carbon and hydrogen bonds have been observed in the obtained structures by means of FTIR. Obvious prospectives of DLC nanocomposite film as a promissing nanophotonic material has been discussed.
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Zh. Panosyan, A. Gharibyan, A. Sargsyan, H. Panosyan, D. Hayrapetyan, and Y. Yengibaryan "Preparation and investigation of diamond-like carbon nanocomposite thin films for nanophotonics", Proc. SPIE 7755, Nanophotonic Materials VII, 77550Q (10 September 2010); https://doi.org/10.1117/12.863079
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Cited by 3 scholarly publications.
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KEYWORDS
Refractive index

Carbon

Nitrogen

Raman spectroscopy

Plasma

Silicon

Plasma enhanced chemical vapor deposition

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