A new laser patterning technology for low cost poly-Si thin film solar cells

Si-Woo Lee; Yoo-Jin Lee; Young-Ho Lee; Jong-Kab Chung; Dong-Jee Kim

doi:10.1117/12.860287

8 September 2010 A new laser patterning technology for low cost poly-Si thin film solar cells

Si-Woo Lee, Yoo-Jin Lee, Young-Ho Lee, Jong-Kab Chung, Dong-Jee Kim

Proceedings Volume 7771, Thin Film Solar Technology II; 777107 (2010) https://doi.org/10.1117/12.860287
Event: SPIE Solar Energy + Technology, 2010, San Diego, California, United States

Abstract

A new laser scribing scheme for poly-Si based thin film solar cell is proposed. This technology consists of 1) simultaneous removal of underlying TCO and poly-Si film, 2) electrical isolation by resin coating using inkjet and 3)selective top electrode removal by laser ablation of photoresist mask layer followed by chemical etching. Process defects such as crack and parasitic melting can be eliminated by proposed patterning technology. This process can be highly cost-effective because less laser patterning steps are required and less area for series interconnection is needed. Poly-Si thin film solar cell was successfully fabricated and showed 7.4% of conversion efficiency.

Citation Download Citation

Si-Woo Lee, Yoo-Jin Lee, Young-Ho Lee, Jong-Kab Chung, and Dong-Jee Kim "A new laser patterning technology for low cost poly-Si thin film solar cells", Proc. SPIE 7771, Thin Film Solar Technology II, 777107 (8 September 2010); https://doi.org/10.1117/12.860287

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