Resist process windows in electron-beam lithography

Andrew T. Jamieson; Nathan Wilcox; Wai Y. Kwok; Yong Kwan Kim

doi:10.1117/12.868037

24 September 2010 Resist process windows in electron-beam lithography

Andrew T. Jamieson, Nathan Wilcox, Wai Y. Kwok, Yong Kwan Kim

Proceedings Volume 7823, Photomask Technology 2010; 78230B (2010) https://doi.org/10.1117/12.868037
Event: SPIE Photomask Technology, 2010, Monterey, California, United States

Abstract

High resolution sub resolution assist features (SRAFs) are challenging to pattern, especially on photomasks with pattern density variations and beam corrections. This paper presents analysis techniques of SRAF resist resolution performance and manufacturing robustness. Electron beam proximity effects and their correction methods impact aerial image quality. Resist resolution and LER depend strongly on the aerial image, and these effects will be looked at theoretically and experimentally with CDSEM and reflected die-to-die inspection techniques. A quantitative understanding of resolution process latitude is important in SRAF patterning, especially when one considers beam corrections that are used to compensate for effects like electron fogging and etch loading.

Citation Download Citation

Andrew T. Jamieson, Nathan Wilcox, Wai Y. Kwok, and Yong Kwan Kim "Resist process windows in electron-beam lithography", Proc. SPIE 7823, Photomask Technology 2010, 78230B (24 September 2010); https://doi.org/10.1117/12.868037

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available