Statistical-noise effect on power spectrum of line-edge and line-width roughness with long-range correlation

Atsushi Hiraiwa; Akio Nishida

doi:10.1117/12.878582

20 April 2011 Statistical-noise effect on power spectrum of line-edge and line-width roughness with long-range correlation

Atsushi Hiraiwa, Akio Nishida

Author Affiliations +

Proceedings Volume 7971, Metrology, Inspection, and Process Control for Microlithography XXV; 79710J (2011) https://doi.org/10.1117/12.878582
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

We formerly developed the "assembly method" for analyzing the line-edge and line-width roughness (LER/LWR) that has a long-range correlation beyond the conventional analysis limit. In the method, we repeatedly assembled virtual long lines by gathering line segments, which were arbitrarily disposed on actual long lines and by randomly changing their combination and order, permitting the assembled lines to share the same line segments. Then, we obtained the PSD of the LER/LWR of the assembled lines considering the lines as seamless. We also derived an analytic formula of the assembled-line PSDs. This formula excellently agreed with experimental PSDs. In this report, we propose guidelines for suppressing the statistical-noise effect on the assembly method for the purpose of accurately analyzing the long-range- correlated LER/LWR. The guidelines will greatly help shed light on the long-range correlation, which causes the variability even in large devices but has long been veiled due to the lack of metrology.

Citation Download Citation

Atsushi Hiraiwa and Akio Nishida "Statistical-noise effect on power spectrum of line-edge and line-width roughness with long-range correlation", Proc. SPIE 7971, Metrology, Inspection, and Process Control for Microlithography XXV, 79710J (20 April 2011); https://doi.org/10.1117/12.878582

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