Spectral polarimetry-based measurement of the thickness of a thin film

P. Hlubina; J. Luňáček; D. Ciprian

doi:10.1117/12.889417

27 May 2011 Spectral polarimetry-based measurement of the thickness of a thin film

P. Hlubina, J. Luňáček, D. Ciprian

Proceedings Volume 8082, Optical Measurement Systems for Industrial Inspection VII; 80822T (2011) https://doi.org/10.1117/12.889417
Event: SPIE Optical Metrology, 2011, Munich, Germany

Abstract

A simple polarimetry configuration is used for measuring the thickness of a nonabsorbing thin film on an absorbing substrate from the ratio between the spectral reflectances of p- and s-polarized components reflected from the thin-film structure. The spectral reflectance ratio measured at a fixed angle of incidence is fitted to the theoretical one to obtain the thin-film thickness provided that the optical constants of the thin-film structure are known. This procedure is used for measuring different thicknesses of a SiO₂ thin film on a Si substrate. Moreover, an approximate linear relation between the thin-film thickness and a wavelength of the maximum of the reflectance ratio for a specific angle of incidence is revealed when the substrate is weakly absorbing. The application of this method is once again demonstrated in determining the thicknesses of the SiO₂ thin films. The results of the techniques are compared with those obtained by a technique of spectral reflectometry, and a very good agreement is confirmed.

Citation Download Citation

P. Hlubina, J. Luňáček, and D. Ciprian "Spectral polarimetry-based measurement of the thickness of a thin film", Proc. SPIE 8082, Optical Measurement Systems for Industrial Inspection VII, 80822T (27 May 2011); https://doi.org/10.1117/12.889417

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