Paper
21 March 2012 Deformations of soft imprint templates in the nanoimprint lithography
Jian He, S. Howitz, S. Killge, K. Richter, J. W. Bartha
Author Affiliations +
Abstract
Soft imprint templates trend to deformation when imprint forces are added. This deformation occurs both in the macro aspect (unevenness of the imprint resist layer through the whole imprint area) and in the micro aspect (deformation of single structure). These deformations will be transferred directly to the imprint resist after its curing and thus influence the imprint results. An understanding of these deformation behaviors depending on the template geometry and the imprint process parameters is necessary for the process development. In this work the deformation behaviors of the polymer soft imprint template was analyzed using finite element method (FEM) and experimentally investigated.
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Jian He, S. Howitz, S. Killge, K. Richter, and J. W. Bartha "Deformations of soft imprint templates in the nanoimprint lithography", Proc. SPIE 8323, Alternative Lithographic Technologies IV, 83231B (21 March 2012); https://doi.org/10.1117/12.916287
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KEYWORDS
Nanoimprint lithography

Finite element methods

CMOS technology

Electroluminescence

Neodymium

Polymers

Silicon

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