Review of substrate materials, surface metrologies and polishing techniques for current and future-generation EUV/x-ray optics

Regina Soufli; Sherry L. Baker; Eric M. Gullikson; Tom McCarville; Jeffrey C. Robinson; Dennis Martínez-Galarce; Mónica Fernández-Perea; Michael J. Pivovaroff

doi:10.1117/12.954852

15 October 2012 Review of substrate materials, surface metrologies and polishing techniques for current and future-generation EUV/x-ray optics

Regina Soufli, Sherry L. Baker, Eric M. Gullikson, Tom McCarville, Jeffrey C. Robinson, Dennis Martínez-Galarce, Mónica Fernández-Perea, Michael J. Pivovaroff

Author Affiliations +

Proceedings Volume 8501, Advances in Metrology for X-Ray and EUV Optics IV; 850102 (2012) https://doi.org/10.1117/12.954852
Event: SPIE Optical Engineering + Applications, 2012, San Diego, California, United States

Abstract

This manuscript presents a review of recent advances in EUV/x-ray substrate specification, fabrication and metrology for photolithography, synchrotron sources, free-electron laser sources, solar physics and astronomy. Highlights from ultra-low- expansion glass substrates, silicon and silicon carbide substrates are presented. Selected emerging substrate materials and fabrication technologies are also discussed.

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Regina Soufli, Sherry L. Baker, Eric M. Gullikson, Tom McCarville, Jeffrey C. Robinson, Dennis Martínez-Galarce, Mónica Fernández-Perea, and Michael J. Pivovaroff "Review of substrate materials, surface metrologies and polishing techniques for current and future-generation EUV/x-ray optics", Proc. SPIE 8501, Advances in Metrology for X-Ray and EUV Optics IV, 850102 (15 October 2012); https://doi.org/10.1117/12.954852

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