Optical characterization parameters by study and comparison of subwavelength patterns for color filtering and multispectral purpose

J. Matanga; Y. Lacroute; P. Gouton; E. Bourillot

doi:10.1117/12.2002332

19 February 2013 Optical characterization parameters by study and comparison of subwavelength patterns for color filtering and multispectral purpose

J. Matanga, Y. Lacroute, P. Gouton, E. Bourillot

Author Affiliations +

Proceedings Volume 8659, Sensors, Cameras, and Systems for Industrial and Scientific Applications XIV; 86590R (2013) https://doi.org/10.1117/12.2002332
Event: IS&T/SPIE Electronic Imaging, 2013, Burlingame, California, United States

Abstract

In the present work, we have analyzed the optical parameters of the thin layers Ge, Ag, and Au prepared by lithography and used as front contact and absorber in the C-MOS device structure. The experimental data concern the reflectance R and transmittance T in the visible and near infrared region. The interpretation of these results are based on the method of analysis of R and T developed by Tomlin and on the Mueller numerical method of resolution of nonlinear equation give by Abelès[1] method. Thus we have chosen by comparing all method to use Lorenz-Mie theory diffusion [2]. The simulation results allow us to choose gold to realize our pattern.

Citation Download Citation

J. Matanga, Y. Lacroute, P. Gouton, and E. Bourillot "Optical characterization parameters by study and comparison of subwavelength patterns for color filtering and multispectral purpose", Proc. SPIE 8659, Sensors, Cameras, and Systems for Industrial and Scientific Applications XIV, 86590R (19 February 2013); https://doi.org/10.1117/12.2002332

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