Paper
29 March 2013 Development of new xanthendiol derivatives applied to the negative-tone molecular resists for EB/EUVL
Masatoshi Echigo, Masako Yamakawa, Yumi Ochiai, Yu Okada, Takashi Makinoshima, Masaaki Takasuka
Author Affiliations +
Abstract
In this paper, we report the development of new xanthendiol derivatives applied to the negative-tone molecular resists for EB/EUVL. The new xanthendiol derivatives were easily synthesized by the condensation of aldehydes and dihydroxyaromatic compounds. We found 13-biphenyl-13H-benzoxanthen-3,10-diol was showed the good applicability to the raw material for the resist for EB/EUVL. The EB patterning result showed the resist containing xanthendiol derivative could resolve the 30 nm half-pitch pattern. Furthermore sub 30 nm half-pitch patterns were partially resolved.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Masatoshi Echigo, Masako Yamakawa, Yumi Ochiai, Yu Okada, Takashi Makinoshima, and Masaaki Takasuka "Development of new xanthendiol derivatives applied to the negative-tone molecular resists for EB/EUVL", Proc. SPIE 8682, Advances in Resist Materials and Processing Technology XXX, 86821V (29 March 2013); https://doi.org/10.1117/12.2010926
Lens.org Logo
CITATIONS
Cited by 3 scholarly publications and 3 patents.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Chemical analysis

Industrial chemicals

Line edge roughness

Raw materials

Extreme ultraviolet lithography

Electron beam lithography

Semiconducting wafers

Back to Top