Resolution enhancement through three color photolithography

Zuleykhan Tomova; John T. Fourkas

doi:10.1117/12.2084451

16 March 2015 Resolution enhancement through three color photolithography

Zuleykhan Tomova, John T. Fourkas

Proceedings Volume 9353, Laser 3D Manufacturing II; 935312 (2015) https://doi.org/10.1117/12.2084451
Event: SPIE LASE, 2015, San Francisco, California, United States

Abstract

Multiphoton absorption polymerization uses nonlinear absorption of laser light to expose a negative-tone photoresist locally, creating three-dimensional structures that can have feature sizes on the sub-100 nm scale. The resolution can be further improved using schemes in which a second beam of light prevents exposure of the photoresist. However, the feature pitch that can be achieved by two-color schemes is limited by the inability to deactivate the photoresist completely. One solution to this problem is to develop a method that instead employs three laser beams. Here we discuss the potential advantages of three-color lithographic schemes and demonstrate new materials that pave the way towards the demonstration of three-color lithography.

Citation Download Citation

Zuleykhan Tomova and John T. Fourkas "Resolution enhancement through three color photolithography", Proc. SPIE 9353, Laser 3D Manufacturing II, 935312 (16 March 2015); https://doi.org/10.1117/12.2084451

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