Electron beam written subwavelength gratings for polarization separation in the infrared

V. Pramitha; M. S. Gayathri; Shanti Bhattacharya

doi:10.1117/12.2078607

13 March 2015 Electron beam written subwavelength gratings for polarization separation in the infrared

V. Pramitha, M. S. Gayathri, Shanti Bhattacharya

Proceedings Volume 9374, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VIII; 937412 (2015) https://doi.org/10.1117/12.2078607
Event: SPIE OPTO, 2015, San Francisco, California, United States

Abstract

The design and fabrication of transmission subwavelength binary gratings for operation as polarizing beam splitters (PBSs) at 1550 nm is presented in this paper. An analytical method called the modal method was used for the design as well as to predict the efficiencies of the polarization components in each order. Electron beam lithography has been employed to fabricate the subwavelength grating structures on poly methyl methacrylate (PMMA). The performance of the fabricated PBS has been evaluated by optical testing.

Citation Download Citation

V. Pramitha, M. S. Gayathri, and Shanti Bhattacharya "Electron beam written subwavelength gratings for polarization separation in the infrared", Proc. SPIE 9374, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VIII, 937412 (13 March 2015); https://doi.org/10.1117/12.2078607

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