Paper
13 May 2015 UV/VIS/NIR imaging technologies: challenges and opportunities
Rihito Kuroda, Shigetoshi Sugawa
Author Affiliations +
Abstract
Challenges and opportunities of ultraviolet (UV), visible (VIS) and near-infrared (NIR) light imaging technologies are overviewed in this paper. For light detectors and image sensors for UV/VIS/NIR imaging, it is required that they have high sensitivity for wide spectral light waveband or targeted narrow waveband as well as the high stability of light sensitivity toward UV light based on cost effective technology. Wide spectral response, high sensitivity and high stability advanced Si photodiode (PD) pn junction formation technology based on the flattened Si surface and high transmittance on-chip optical filter formation technology were developed. A linear photodiode array (PDA), wide dynamic range and ultrahigh speed CMOS image sensors employing the developed technology were fabricated and their advanced performances are described in this paper.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Rihito Kuroda and Shigetoshi Sugawa "UV/VIS/NIR imaging technologies: challenges and opportunities", Proc. SPIE 9481, Image Sensing Technologies: Materials, Devices, Systems, and Applications II, 948108 (13 May 2015); https://doi.org/10.1117/12.2180060
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KEYWORDS
Silicon

Ultraviolet radiation

CMOS sensors

Personal digital assistants

Image sensors

Quantum efficiency

Image processing

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