Paper
21 May 2015 Influence of process parameters on properties of piezoelectric AlN and AlScN thin films for sensor and energy harvesting applications
Stephan Barth, Hagen Bartzsch, Daniel Gloess, Peter Frach, Thomas Modes, Olaf Zywitzki, Gunnar Suchaneck, Gerald Gerlach
Author Affiliations +
Abstract
This paper reports on the deposition of AlN and AlXSc1-XN films by pulse magnetron sputtering. The influence of process parameters on the film properties and the evaluation of the films for micro energy harvesting are presented. For AlN it is shown, that film stress can be varied in a considerable range between compressive and tensile stress while maintaining good piezoelectric properties. Additionally, the effect of doping AlN with Sc regarding piezoelectric and mechanical properties is presented. The films show the expected increase of piezoelectric properties as well as the softening of the material with higher Sc concentrations. Above a threshold concentration of around 40% Sc in the AlXSc1-XN films, there exists a separation into two phases, an Al-rich and a Sc-rich wurtzite phase, which is shown by XRD. At Sc concentrations higher than 50%, the films are not piezoelectric, as the films are composed primarily of the cubic ScN phase. Sc doping allows to significantly increase the energy generated in test setup. Up to 350 μW power have been generated under optimum conditions.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Stephan Barth, Hagen Bartzsch, Daniel Gloess, Peter Frach, Thomas Modes, Olaf Zywitzki, Gunnar Suchaneck, and Gerald Gerlach "Influence of process parameters on properties of piezoelectric AlN and AlScN thin films for sensor and energy harvesting applications", Proc. SPIE 9517, Smart Sensors, Actuators, and MEMS VII; and Cyber Physical Systems, 951704 (21 May 2015); https://doi.org/10.1117/12.2179468
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Cited by 3 scholarly publications.
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KEYWORDS
Aluminum nitride

Scandium

Energy harvesting

Thin films

Sputter deposition

Aluminum

Plasma

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