Influence of thickness and annealing temperature on the structure properties of random mask deposited by magnetron sputtering

Jiaoling Zhao; Hu Wang; Hongji Qi; Weili Zhang; Yingjie Chai; Jialu Guo; Hongbo He

doi:10.1117/12.2186014

22 July 2015 Influence of thickness and annealing temperature on the structure properties of random mask deposited by magnetron sputtering

Jiaoling Zhao, Hu Wang, Hongji Qi, Weili Zhang, Yingjie Chai, Jialu Guo, Hongbo He

Author Affiliations +

Proceedings Volume 9532, Pacific Rim Laser Damage 2015: Optical Materials for High-Power Lasers; 953224 (2015) https://doi.org/10.1117/12.2186014
Event: Pacific Rim Laser Damage, 2015, Jiading, Shanghai, China

Abstract

The structure properties of random mask of antireflective structure prepared by the thermal dewetting process are investigated. As a low-cost and large-scale technique, the mask obtained in our work has a great prospect in the field of solar cell and high power laser system. Ultrathin films of amorphous Ag are deposited on the fused silica by magnetron sputtering. By fast thermal annealing the structures in Ag film are agglomerated on the substrate and form mask. The influence of different thickness and annealing temperature on the structure properties of random mask are studied. The surface morphologies are characterized by scanning electronic microscopy. The suitable conditions to obtain excellent quality Ag nanomasks with the pebble particles are achieved.

Citation Download Citation

Jiaoling Zhao, Hu Wang, Hongji Qi, Weili Zhang, Yingjie Chai, Jialu Guo, and Hongbo He "Influence of thickness and annealing temperature on the structure properties of random mask deposited by magnetron sputtering", Proc. SPIE 9532, Pacific Rim Laser Damage 2015: Optical Materials for High-Power Lasers, 953224 (22 July 2015); https://doi.org/10.1117/12.2186014

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KEYWORDS

Annealing

Particles

Dewetting

Silver

Reflectivity

Scanning electron microscopy

Sputter deposition

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