Structual and optical performance of Pd/B4C working from 7.5nm to 12nm

Yiwen Wang; Qiushi Huang; Qiang Yi; Jinshuai Zhang; Mingwu Wen; Jiang Li; Dechao Xu; Zhong Zhang; Zhanshan Wang

doi:10.1117/12.2191296

23 September 2015 Structual and optical performance of Pd/B₄C working from 7.5nm to 12nm

Yiwen Wang, Qiushi Huang, Qiang Yi, Jinshuai Zhang, Mingwu Wen, Jiang Li, Dechao Xu, Zhong Zhang, Zhanshan Wang

Proceedings Volume 9627, Optical Systems Design 2015: Advances in Optical Thin Films V; 96271Q (2015) https://doi.org/10.1117/12.2191296
Event: SPIE Optical Systems Design, 2015, Jena, Germany

Abstract

Boron or boron carbide based multilayers are widely used due to the boron-K absorption edge format λ=6.7nm. Pd/B₄C has a relatively high theoretical reflectivity from 7.5nm to 11nm, compared to other candidates like Mo/B₄C and La/B₄C. It can also be easily fabricated by direct current magnetron sputtering technique. In this paper, different process parameters, including base pressure and sputtering pressure, are optimized to develop the Pd/B₄C multilayer mirror. A reflectance of 36.2% were obtained at 9.41nm with 80 bilayers Pd/B₄C. Reactive sputtering with nitrogen was also explored to improve the structure and reduce the stress of the Pd/B₄C multilayers. The results showed that the EUV reflectance was not improved after the introduction of nitrogen while the stress was actually reduced.

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Yiwen Wang, Qiushi Huang, Qiang Yi, Jinshuai Zhang, Mingwu Wen, Jiang Li, Dechao Xu, Zhong Zhang, and Zhanshan Wang "Structual and optical performance of Pd/B₄C working from 7.5nm to 12nm", Proc. SPIE 9627, Optical Systems Design 2015: Advances in Optical Thin Films V, 96271Q (23 September 2015); https://doi.org/10.1117/12.2191296

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KEYWORDS

Reflectivity

Multilayers

Sputter deposition

Nitrogen

Extreme ultraviolet

Interfaces

Argon

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