Precise fabrication of ultra violet dielectric dispersion compensating mirrors

T. Willemsen; S. Schlichting; T. Kellermann; M. Jupé; H. Ehlers; U. Morgner; D. Ristau

doi:10.1117/12.2191051

23 September 2015 Precise fabrication of ultra violet dielectric dispersion compensating mirrors

T. Willemsen, S. Schlichting, T. Kellermann, M. Jupé, H. Ehlers, U. Morgner, D. Ristau

Proceedings Volume 9627, Optical Systems Design 2015: Advances in Optical Thin Films V; 96271U (2015) https://doi.org/10.1117/12.2191051
Event: SPIE Optical Systems Design, 2015, Jena, Germany

Abstract

The present contribution is concentrated on an improved method to manufacture dielectric dispersion compensating mirrors in the ultra violet (UV) range by applying a novel online phase monitoring device. This newly developed measurement tool monitors the group delay (GD) and group delay dispersion (GDD) of the electromagnetic field in situ during the deposition of the layer system. Broad band monitoring of the phase enhances the accuracy in the near infrared spectral range (NIR), significantly. In this study, the correlation of the GDD in the NIR and in the UV spectral range is investigated. A design synthesis is introduced to achieve optimum reflection and GDD target values in the UV and NIR. This requires a similar behavior of both bands according to deposition errors, to guarantee switching off the UV GDD target band proper, while monitoring the GDD in the NIR spectral range. The synthesis results in a design, characterized by a GDD of -100fs²±20fs² between 330nm and 360nm in the UV and by -450fs²±10fs² within 820nm to 870nm in the NIR. The fabricated sample, applying an ion beam sputtering process, consists of a 9μm layer stack of Hafnium oxide and Silicon dioxide. The first layers of the stack are switched and controlled by a conventional in situ spectrometric broad band monitoring in conjunction with a forward re-optimization algorithm, which also manipulates the layers remaining for deposition at each switching event. To accomplish the demanded GDD-spectra, the last layers are controlled by the novel in situ GDD monitor.

Citation Download Citation

T. Willemsen, S. Schlichting, T. Kellermann, M. Jupé, H. Ehlers, U. Morgner, and D. Ristau "Precise fabrication of ultra violet dielectric dispersion compensating mirrors", Proc. SPIE 9627, Optical Systems Design 2015: Advances in Optical Thin Films V, 96271U (23 September 2015); https://doi.org/10.1117/12.2191051

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available