Development of various EUV sources for application in actinic tools for EUV masks

Donggun Lee

doi:10.1117/12.2687021

22 November 2023 Development of various EUV sources for application in actinic tools for EUV masks

Donggun Lee

Proceedings Volume PC12750, International Conference on Extreme Ultraviolet Lithography 2023; PC127500P (2023) https://doi.org/10.1117/12.2687021
Event: SPIE Photomask Technology + EUV Lithography, 2023, Monterey, California, United States

Abstract

As the mass production of semiconductors using EUV lithography began in earnest, actinic tool that applied various types of EUV source became necessary. Each EUV source has its own pros and cons, and for this reason, the actinic tools to which each EUV source can be applied are different, and no one EUV source is suitable for all actnic tools. In this presentation, we will focus on the EUV source applied to the actnic tool being developed by ESOL, but there will be an explanation of which EUV source is suitable for which actnic tool by adding other types of EUV sources.

Conference Presentation

Citation Download Citation

Donggun Lee "Development of various EUV sources for application in actinic tools for EUV masks", Proc. SPIE PC12750, International Conference on Extreme Ultraviolet Lithography 2023, PC127500P (22 November 2023); https://doi.org/10.1117/12.2687021

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