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Microscopy is one of the most widely non-contact measurement techniques used in industry today. The most important component in microscopy is the illumination and imaging numerical aperture (NA) because it sets the final limits and capabilities of the microscopy system. A wrong numerical aperture value will affect the measurement of surface profiles. Large NA objectives measure smaller heights and are not able to reach the lateral resolution that they should. In this research we propose a new experimental NA calibration method to resolve the abovementioned issues on objectives with NAs of 0.1-0.95. The presented method is attractive since it does not require an external setup but calibrates the objective within the microscope and it is simple to implement. The results of experimental measurements with the commercial microscope objectives Nikon, Mitutoyo and ZEISS are presented in this study.
Poul Erik Hansen andLauryna Siaudinyte
"Determination of the numerical aperture for spectroscopic microscopy beyond the diffraction limit", Proc. SPIE PC12778, Optifab 2023, PC127780A (30 November 2023); https://doi.org/10.1117/12.2685124
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Poul Erik Hansen, Lauryna Siaudinyte, "Determination of the numerical aperture for spectroscopic microscopy beyond the diffraction limit," Proc. SPIE PC12778, Optifab 2023, PC127780A (30 November 2023); https://doi.org/10.1117/12.2685124