Enhancing wafer productivity through increased repetition rate to 6.75khz with gt80a as ArF immersion light source

Natsuhiko Kouno; Katsuhiko Wakana; Takeshi Ohta; Takashi Saitou

doi:10.1117/12.3009787

10 April 2024 Enhancing wafer productivity through increased repetition rate to 6.75khz with gt80a as ArF immersion light source

Natsuhiko Kouno, Katsuhiko Wakana, Takeshi Ohta, Takashi Saitou

Author Affiliations +

Proceedings Volume PC12953, Optical and EUV Nanolithography XXXVII; PC129530T (2024) https://doi.org/10.1117/12.3009787
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Conference Poster

Abstract

Gigaphoton has developed the advanced ArF immersion (ArFi) light source GT80A to enhance wafer productivity. GT80A operates at 6.75kHz, surpassing conventional ArFi light sources limited to 6kHz. Enhanced power supply modules offer reduced charging times and lower electricity consumption. The novel laser chamber design optimizes gas flow and minimizes acoustic wave impact, maintaining dose stability and reducing fluctuation of E95% bandwidth (E95) under a given repetition rate setting. A refined line narrowing module (LNM) tackles challenges at 6.75kHz, enhancing wavelength control. GT80A operates effectively at 6.75kHz while ensuring stability in dose, E95 and wavelength. The design also addresses optical component life duration, counteracting increased heat load effects to maintain seamless 6.75kHz operation without compromising availability.

Citation Download Citation

Natsuhiko Kouno, Katsuhiko Wakana, Takeshi Ohta, and Takashi Saitou "Enhancing wafer productivity through increased repetition rate to 6.75khz with gt80a as ArF immersion light source", Proc. SPIE PC12953, Optical and EUV Nanolithography XXXVII, PC129530T (10 April 2024); https://doi.org/10.1117/12.3009787

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