Fabrication of ultrahigh aspect ratio silicon nanostructures using self-assembled gold metal-assisted chemical etching

Joshua M. Duran; Andrew Sarangan

doi:10.1117/1.JMM.16.1.014502

1 February 2017 Fabrication of ultrahigh aspect ratio silicon nanostructures using self-assembled gold metal-assisted chemical etching

Joshua M. Duran, Andrew Sarangan

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 16, Issue 1, 014502 (February 2017). https://doi.org/10.1117/1.JMM.16.1.014502

Abstract

We report the critical factors that control the geometry of silicon nanostructures produced by metal-assisted chemical etching (MacEtch) using self-assembled islands from an ultrathin film of gold. We have conducted a systematic study of the process parameters that control the geometry of the metal structures and the resulting etched nanostructures. Compared to prior reports, which have focused on the crystal orientation and solution stoichiometry, our study finds that the anisotropy of the etched nanostructures is primarily controlled by the deposited metal geometry, while solution stoichiometry and crystal orientation play relatively minor roles. Using an optimized self-assembled geometry and etch process, we demonstrate what we believe is the highest aspect ratio to date (greater than 5000∶1) for high density top-down etched silicon nanostructures. These structures, which we refer to as silicon nanowalls, are in the size regime where quantum confinement effects could potentially be exploited for next-generation optoelectronic components and devices.

CC BY: © The Authors. Published by SPIE under a Creative Commons Attribution 4.0 Unported License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.

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Joshua M. Duran and Andrew Sarangan "Fabrication of ultrahigh aspect ratio silicon nanostructures using self-assembled gold metal-assisted chemical etching," Journal of Micro/Nanolithography, MEMS, and MOEMS 16(1), 014502 (1 February 2017). https://doi.org/10.1117/1.JMM.16.1.014502

Received: 11 October 2016; Accepted: 6 January 2017; Published: 1 February 2017

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Cited by 17 scholarly publications and 3 patents.

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KEYWORDS

Etching

Metals

Silicon

Nanostructures

Gold

Nanolithography

Scanning electron microscopy

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