The Journal of Micro/Nanopatterning, Materials, and Metrology (JM 3) publishes peer-reviewed papers on the core enabling technologies that address the patterning needs of the electronics industry. Formerly the Journal of Micro/Nanolithography, MEMS, and MOEMS, the journal’s key subject areas include the science, development, and practice of lithographic, computational, etch, and integration technologies. In this context the electronics industry includes but is not limited to integrated circuits and multichip modules, and advanced packaging with features in the submicron regime.
On the cover: The figure is from the Gold Open Access paper "Multi-beam mask writing opens up new fields of application, including curvilinear mask pattern for high numerical aperture extreme ultraviolet lithography" by Mathias Tomandl et al. in the Speical Section on Curvilinear Masks , Part 1, guest-edited by Linyong (Leo) Pang and Danping Peng.
