Extreme ultraviolet lithography: overview and development status

Peter J. Silverman

doi:10.1117/1.1862647

1 January 2005 Extreme ultraviolet lithography: overview and development status

Peter J. Silverman

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 4, Issue 1, 011006 (January 2005). https://doi.org/10.1117/1.1862647

Abstract

Extreme ultraviolet (EUV) lithography has emerged as the most likely successor to 193-nm lithography. We provide a technical overview of EUV lithography and a discussion of the advantages of EUV lithography over alternative technologies. The key challenges in developing EUV exposure tools for high-volume production are discussed. A brief assessment is given of the cost of ownership of EUV lithography in comparison with 193-nm immersion lithography.

©(2005) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Peter J. Silverman "Extreme ultraviolet lithography: overview and development status," Journal of Micro/Nanolithography, MEMS, and MOEMS 4(1), 011006 (1 January 2005). https://doi.org/10.1117/1.1862647

Published: 1 January 2005

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