Special Section Guest Editorial: Novel Patterning Technologies II

Douglas J. Resnick; Eric M. Panning

doi:10.1117/1.JMM.21.1.011001

8 March 2022 Special Section Guest Editorial: Novel Patterning Technologies II

Douglas J. Resnick, Eric M. Panning

Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 21, Issue 1, 011001 (March 2022). https://doi.org/10.1117/1.JMM.21.1.011001

Abstract

Guest editors Doug Resnick and Eric Panning introduce the Special Section on Novel Patterning Technologies II.

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Douglas J. Resnick and Eric M. Panning "Special Section Guest Editorial: Novel Patterning Technologies II," Journal of Micro/Nanopatterning, Materials, and Metrology 21(1), 011001 (8 March 2022). https://doi.org/10.1117/1.JMM.21.1.011001

Published: 8 March 2022

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KEYWORDS

Optical lithography

Lithography

Nanoimprint lithography

Nanotechnology

Semiconducting wafers

Wet etching

Satellites

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