Procedure for producing uniform layers of photoresist for holographic applications

Arturo Olivares-Perez

doi:10.1117/12.133298

1 June 1993 Procedure for producing uniform layers of photoresist for holographic applications

Arturo Olivares-Perez

Author Affiliations +

Optical Engineering, Vol. 32, Issue 6, (June 1993). https://doi.org/10.1117/12.133298

Abstract

We propose a model of the behavior of the thickness of the layers in photoresist Shipley 1350-J on a glass substrate. The photoresist is deposited using a centrifuge. The deposit is not uniform; the layers in the center are thicker than those at the rim. The model presented is obtained by fitting measurements to a modified Gaussian function with less than 1% error of the real behavior. The problem of uniformity is solved by diluting the photoresist with isopropyl alcohol. The proposed model uses parameters that control the uniformity of the photoresist layers on the substrate. This parameter control is important for obtaining high-quality optical holographic elements.

Citation Download Citation

Arturo Olivares-Perez "Procedure for producing uniform layers of photoresist for holographic applications," Optical Engineering 32(6), (1 June 1993). https://doi.org/10.1117/12.133298

Published: 1 June 1993

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available