Mr. Aaron M. Bowser Profile

Aaron M. Bowser

Lithography Development Manager at Seagate Technology LLC

SPIE Involvement:

Author

Publications (2)

This will count as one of your downloads.

You will have access to both the presentation and article (if available).

DOWNLOAD NOW

This content is available for download via your institution's subscription. To access this item, please sign in to your personal account.

Email or Username Forgot your username?

Password Forgot your password?

Show

Keep me signed in

No SPIE account? Create an account

Proceedings Article | 23 March 2020 Paper

Target recovery process optimization to improve image based overlay performance for critical recording head manufacturing processes

Yi Liu, Dan Yu, Aaron Bowser

Proceedings Volume 11327, 113271A (2020) https://doi.org/10.1117/12.2550782

KEYWORDS: Overlay metrology, Lithography

Read Abstract +

Overlay and alignment target recovery process is often required in recording head fabrication where targets are covered by opaque materials. In this study, we have investigated the recovery process impact on the image based overlay (IBO) measurement performance in critical stages of the recording head fabrication. The trench topography created by the target recovery process can result in the asymmetric resist coating uniformity across the wafer and result in errors in the measured overlay values and modeled correctable wafer terms such as the scale and rotation. These errors become significant at critical pattering layers when there is a large z-spacing between the current resist overlay mark and the previous overlay reference mark layer. The recovery pattern size and the recovery depth impact on the measured overlay performance are evaluated. The overlay mark needs to be optimized to reduce the overlay measurement variation. Overlay mark designs, including box-in-box, AIMid and multi AIMid overlay marks, are investigated. Self-referencing marks (SRM) are used to evaluate recovery process and overlay mark impacts on overlay measurement accuracy.

Proceedings Article | 20 March 2020 Paper

Color filter and numeric aperture selections for image based overlay measurement in critical recording head manufacturing process

Gavin Mathias, Yi Liu, Richard Schuster, Aaron Bowser

Proceedings Volume 11325, 113252B (2020) https://doi.org/10.1117/12.2550692

KEYWORDS: Overlay metrology, Optical filters, Metrology, Semiconducting wafers, Head, Manufacturing

Read Abstract +

Overlay control for recording head manufacturing is becoming increasingly challenging as design geometry specifications tighten in the transition to advanced Heated Assisted Magnetic Recording (HAMR) devices. As overlay control requirements for critical patterning layers tighten below 5nm, the need for accurate and robust overlay metrology is key to enabling the patterning roadmap and improving yields. This work focuses on improving Imaged Based Overlay (IBO) metrology to ensure accurate overlay measurements for critical lithography steps in the recording head fabrication process. Selection of the optimal settings for color filter and Numeric Aperture (NA) parameters can have a significant impact on overlay measurement accuracy and Total Measurement Uncertainty (TMU) when setting up a new overlay metrology recipe^1-2. These overlay metrology recipe parameters can be selected to minimize the influence of process induced overlay target imperfections on the measured overlay ³. This paper reports our revised workflow for selecting IBO measurement conditions and evaluating pre-existing recipes for robustness. We utilize metrics such as the overlay model residuals, Tool Induced Shift (TIS), and Qmerit error in identifying recipes requiring improvement. The new “Train Log” feature available on KLA’s Archer™ IBO metrology tool platform can be used to compare the through focus contrast precision of different illumination conditions at the time of recipe creation. In this study, we show that an optimization workflow that utilizes the “Train Log” collection of the contrast precision metric and imageless recipes in selecting color filter and numeric aperture settings can significantly improve the overlay measurement repeatability and tool to tool matching.

My Library

You currently do not have any folders to save your paper to! Create a new folder below.

Folder Name

Folder Description

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks. You are receiving this notice because your organization may not have SPIE eBooks access.*

*Shibboleth/Open Athens users─please sign in to access your institution's subscriptions.

To obtain this item, you may purchase the complete book in print or electronic format on SPIE.org.

ORGANIZATIONAL
Sign in with credentials provided by your organization.

Organizational Username

Organizational Password

Show/Hide Password

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members:

Non-members: ADD TO CART

Keywords/Phrases

Search In:

Publication Years