Dr. Amine Lakcher Profile

Dr. Amine Lakcher

Process Integration Engineer at Qualcomm

SPIE Involvement:

Author

Area of Expertise:

metrology , lithography , semiconductor , process integration

Publications (7)

Proceedings Article | 20 March 2020 Paper

On-product focus monitoring and control for immersion lithography in 3D-NAND manufacturing

Amine Lakcher, Ahmed Zayed, Jennifer Shumway, Jan-Pieter van Delft, Gratiela Isai, Ruxandra Mustata, Arno van den Brink, Taeddy Kim, Jay Jung, Yong-Sik Shin, Soo-Kyung Lee, Paul Böcker, Mohamed El Kodadi, Geert Vinken, ChanHa Park, Sangjun Han, Jeongsu Park, Beomki Shin, Gunwoong Lee

Proceedings Volume 11325, 1132521 (2020) https://doi.org/10.1117/12.2552930

KEYWORDS: Semiconducting wafers, Metrology, Scanners, Immersion lithography, Critical dimension metrology, Lithography, Lithographic process control

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Proceedings Article | 19 September 2018 Paper

Microlens under melt in-line monitoring based on application of neural network automatic defect classification

Julien Ducoté, Amine Lakcher, Laurent Bidault, Antoine-Regis Philipot, Alain Ostrovsky, Etienne Mortini, Bertrand Le-Gratiet

Proceedings Volume 10775, 107750S (2018) https://doi.org/10.1117/12.2326397

KEYWORDS: Microlens, Neural networks, Image processing, Image classification, Metrology, Lithography, Convolutional neural networks, Imaging systems, Semiconducting wafers, Data modeling

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Proceedings Article | 20 March 2018 Paper

SEM contour based metrology for microlens process studies in CMOS image sensor technologies

Amine Lakcher, Alain Ostrovsky, Bertrand Le-Gratiet, Ludovic Berthier, Laurent Bidault, Julien Ducoté, Clémence Jamin-Mornet, Etienne Mortini, Maxime Besacier

Proceedings Volume 10587, 105870T (2018) https://doi.org/10.1117/12.2297396

KEYWORDS: Microlens, Scanning electron microscopy, Image processing, Metrology, Photodiodes, Quantum efficiency, CMOS sensors, Neural networks, Lithography

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Proceedings Article | 28 September 2017 Paper

Advanced metrology by offline SEM data processing

Amine Lakcher, Loïc Schneider, Bertrand Le-Gratiet, Julien Ducoté, Vincent Farys, Maxime Besacier

Proceedings Volume 10446, 104460L (2017) https://doi.org/10.1117/12.2280096

KEYWORDS: Metrology, Scanning electron microscopy, Lithography, Data processing, Etching, Inspection, Process control

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Proceedings Article | 28 March 2017 Paper

Robust 2D patterns process variability assessment using CD-SEM contour extraction offline metrology

Amine Lakcher, Bertrand Le-Gratiet, Julien Ducoté, Pierre Fanton, Ton Kiers, Jan-Willem Gemmink, Stefan Hunsche, Christopher Prentice, Maxime Besacier

Proceedings Volume 10145, 1014514 (2017) https://doi.org/10.1117/12.2257876

KEYWORDS: Etching, Metrology, Lithography, Scanning electron microscopy, Inspection, Process control, Manufacturing, Process engineering, Chemical mechanical planarization, Copper, Semiconducting wafers, Metals, Image processing, Optical alignment

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Proceedings Article | 28 March 2017 Paper

Advanced in-production hotspot prediction and monitoring with micro-topography

P. Fanton, T. Hasan, A. Lakcher, B. Le-Gratiet, C. Prentice, J.-G. Simiz, R. La Greca, L. Depre, S. Hunsche

Proceedings Volume 10145, 101450X (2017) https://doi.org/10.1117/12.2260024

KEYWORDS: Semiconducting wafers, Metrology, Optical lithography, Electron beam lithography, Scanners, Finite element methods, Scanning electron microscopy, Lithography, Inspection, Computational lithography

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Proceedings Article | 20 October 2016 Paper

Translation of lithography variability into after-etch performance: monitoring of golden hotspot

Jo Finders, Ton Kiers, Bertrand Le Gratiet, Amine Lakcher

Proceedings Volume 10032, 100320H (2016) https://doi.org/10.1117/12.2249565

KEYWORDS: Lithography, Scanning electron microscopy, Etching, Semiconducting wafers, Metrology, Line edge roughness, Photomasks, Computer aided design, Process engineering, Optical alignment

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Showing 5 of 7 publications

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