Optical and crystal properties of InGaN/GaN multiple quantum well (MQW) structures grown by metalorganic chemical
vapor deposition (MOCVD) were characterized using room-temperature photoluminescence (PL) and high-resolution Xray
diffraction (HRXRD), respectively. The near bandgap excitonic peak decreased from 2.77 eV to 2.68 eV while there
was a 10 Å increase in the well thickness, probably caused by variations of quantized energy levels. In addition, higher
growth temperature of MQW structures had a small influence on the pair thickness, but the emission wavelength showed
a blueshift attributed to the decrease in average of indium mole fraction. However, the near bandgap excitonic peak
remained constant for the thicker quantum barriers. For the PL emission intensity of InGaN/GaN MQW structures, it was
enhanced with a thinner quantum well width and a thicker quantum barrier, which could be resulted from the
improvement of optical confinement in the quantum well. Moreover, by using the higher growth temperature, enhanced
PL intensity was achieved due to the improvement of structure quality for the InGaN/GaN heterostructure. Therefore,
these results suggest that the emission wavelength and intensity of the InGaN/GaN MQW-based optical device could be
modulated by designing thicknesses of quantum wells as well as growth temperatures of MQW structures.
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