Corning has focused its recent efforts on coefficient of thermal expansion (CTE) metrology improvements. Due to the unique environment required for EUVL technology, EUVL optics (and photomasks) require extremely uniform CTE properties, with targeted variations of less than 1ppb/K. Until now, no practical metrology technique existed that could accurately verify if a material met such requirements due to the lack of precision. Corning has previously introduced the idea of measuring CTE in ULE (registered trademark) Glass using Phase Measuring Interferometry (PMI) by discovering the correlation between refractive index and CTE in ULE (registered trademark) Glass. However, refinement of the correlation was necessary. This paper focuses on the progress made towards that end, which has resulted in the ability to non-destructively measure peak to valley CTE variations to within 57 parts per trillion per degree Kelvin (ppt/K) at possible spatial resolutions in the micron range on thick or thin samples.
Corning Incorporated is improving material and metrology in order to meet the requirements for both EUVL optics and photomask substrate applications. The EUV optics requirements present a unique challenge to the lens designer. The temperature of each optic in the system can experience a different thermal profile based upon the geometry of the element and the intensity of the beam at each element location. This places a need on the optical material for small variation in the coefficient of thermal expansion (CTE) uniformity and the ability to achieve targeted optimum zero CTE cross-over temperatures. This paper addresses Corning’s ability to target specified CTE values as well as discusses a new metrology tool for measuring CTE variations within the glass. Past data suggested that index variation within the material were related to CTE variations. This correlation was investigated with the results presented here. This preliminary work suggests a new metrology tool with the capability of non-destructively measuring peak to valley (P-V) CTE variations to within 70 parts per trillion per degree Kelvin (ppt/K) at possible spatial frequencies in the micron range on thick or thin samples. This technique is vital for certifying photomasks and will be the foundation needed to reduce CTE variations in photomasks and optics to targeted values of less than 1 ppb/K for future EUVL needs.
As optical lithographers push to extend optical lithography technologies to create smaller features with higher NA, lower k1 values and shorter wavelengths, transmitted wavefront specifications for HPFSR fused silica blanks continue to tighten. HPFSR fused silica blanks are typically certified for acceptance using an interferometer operating at a wavelength of 632.8 nm. As the market demands increasingly tighter homogeneity specifications, it has become critical to understand the sources of variation in wavefront measurements. Corning has recently initiated a study to identify those sources of variation. One glass attribute being studied is the impact of residual stress on the wavefront. It is known that residual stresses can alter the refractive index of fused silica. To obtain the residual stress measurements, birefringence measurements were obtained at 632.8 nm for comparison to wavefront measurements at 632.8 nm. The relationship between residual birefringence and transmitted wavefront measurements, at 632.8 nm on Corning HPFSR fused silica blanks, is explored in this paper.
Interferometrically measuring the index of refraction variation (index homogeneity) of glass blanks requires that the blanks be made transparent to the interferometer laser. One method for achieving this is to 'sandwich' a rough ground blank between two polished flats while adding an index matching liquid at each surface interface. This is better known as oil-on-flat (OOF) or oil-on-plate testing. Another method requires polishing both surfaces and is better known as polished homogeneity (PHOM) testing or the Schwider method. Corning Inc. historically has used OOF testing to measure the index homogeneity of disk-shaped, fused silica boules over multiple 18' diameter apertures. Recently a boule polishing and PHOM testing process was developed by Corning for measuring the homogeneity over 24' diameter apertures to support fused silica production for the National Ignition Facility (NIF). Consequently, the PHOM technique has been compared to the OOF process using a number of different methods including repeatability/reproducibility studies, data stitching, and vibration analysis. The analysis performed demonstrates PHOM's advantages over OOF testing.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.