Dr. Andrew Khoh Profile

Dr. Andrew Khoh

Senior Engineer at GLOBALFOUNDRIES Inc

SPIE Involvement:

Author

Publications (7)

Proceedings Article | 28 March 2014 Paper

Resist profile aware source mask optimization

Ao Chen, Yee Mei Foong, Michael Hsieh, Andrew Khoh, Stephen Hsu, Mu Feng, Jianhong Qiu, Chris Aquino

Proceedings Volume 9053, 90530X (2014) https://doi.org/10.1117/12.2046252

KEYWORDS: Source mask optimization, Optical proximity correction, Semiconducting wafers, Image processing, Photomasks, Photoresist processing, Critical dimension metrology, Cadmium, Scanning electron microscopy, Molybdenum

Read Abstract +

Proceedings Article | 20 March 2006 Paper

Maximizing test pattern coverage for OPC model build

Andrew Khoh, Shyue-Fong Quek, Yee-Mei Foong, Jacky Cheng, Byoung-Il Choi

Proceedings Volume 6154, 615437 (2006) https://doi.org/10.1117/12.660292

KEYWORDS: Optical proximity correction, Product engineering, Model-based design, Calibration, Visualization, Critical dimension metrology, Analytical research, Semiconductor manufacturing, Optical lithography, Mirror structures

Read Abstract +

Proceedings Article | 10 May 2005 Paper

Modeling of wafer alignment marks using geometrical theory of diffraction (GTD)

Chin Tan, Swee Yeo, Andrew Khoh

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599252

KEYWORDS: Diffraction, Optical alignment, Semiconducting wafers, Polarization, Diffraction gratings, Reflection, Solids, Silicon, Optical lithography, Ray tracing

Read Abstract +

Proceedings Article | 16 June 2003 Paper

Extending a GTD-based image formation technique to EUV lithography

Andrew Khoh, Donis Flagello, Thomas Milster, Byoung-Il Choi, Ganesh Samudra, Yihong Wu

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.485501

KEYWORDS: Photomasks, Lithographic illumination, Extreme ultraviolet, Image acquisition, Diffraction, Extreme ultraviolet lithography, Polarization, Lithography, Optical proximity correction, Binary data

Read Abstract +

Proceedings Article | 30 July 2002 Paper

Influence of OPC features on the profile of 2D mask patterns

Andrew Khoh, Tomas Milster, Byoung-Il Choi, Ganesh Samudra, Yihong Wu

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474493

KEYWORDS: Diffraction, Image acquisition, Modulation, Optical proximity correction, Photomasks, Solids, Point spread functions, Semiconductor manufacturing, Image segmentation, Feature extraction

Read Abstract +

Proceedings Article | 14 September 2001 Paper

Impact of scattering bar in the presence of lens aberrations

Andrew Khoh, Blandine Minghetti, Byoung-Il Choi, Yihong Wu, Ganesh Samudra

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435698

KEYWORDS: Scattering, Monochromatic aberrations, Diffraction, Wavefronts, Spatial frequencies, Lithography, Deep ultraviolet, Photomasks, Calcium, Lithographic illumination

Read Abstract +

Proceedings Article | 5 July 2000 Paper

Practical optical-proximity-correction approach by considering interlayer overlap

Byoung-Il Choi, Andrew Khoh

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389022

KEYWORDS: Optical proximity correction, Metals, Model-based design, Photomasks, Printing, Visualization, Photoresist processing, Image analysis, Data modeling, Optics manufacturing

Read Abstract +

Showing 5 of 7 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years