Dr. Andrew Joseph Watts Profile

Dr. Andrew Joseph Watts

Senior Engineer Manager

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Author

Publications (12)

Proceedings Article | 23 March 2009 Paper

Cr migration on 193nm binary photomasks

John Bruley, Geoffrey Burr, Robert Davis, Philip Flaitz, William Hinsberg, Frances Houle, Dolores Miller, Michael Pike, Jed Rankin, Alfred Wagner, Andrew Watts

Proceedings Volume 7272, 727215 (2009) https://doi.org/10.1117/12.813934

KEYWORDS: Photomasks, Chromium, Semiconducting wafers, Binary data, Manufacturing, Diffusion, Transmission electron microscopy, Roads, Photoresist materials, Oxidation

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Proceedings Article | 14 May 2007 Paper

Pellicle factors affecting finished photomask flatness

K. Racette, A. Watts, M. Barrett, R. Nolan, Y. Sasaki, Y. Kikuchi, T. Matsumura

Proceedings Volume 6607, 66071V (2007) https://doi.org/10.1117/12.728978

KEYWORDS: Pellicles, Photomasks, Adhesives, Distortion, Platinum, Manufacturing, Optical lithography, Optics manufacturing, Electronics, Printing

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Proceedings Article | 20 October 2006 Paper

Sulfur-free cleaning strategy for advanced mask manufacturing

Louis Kindt, Andrew Watts, Jay Burnham, William Aaskov

Proceedings Volume 6349, 63491J (2006) https://doi.org/10.1117/12.686228

KEYWORDS: Ozone, Scanning probe microscopy, Photomasks, Photoresist processing, Cryogenics, Manufacturing, Particles, Fermium, Frequency modulation, Inspection

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Proceedings Article | 20 May 2006 Paper

Photomask automation improvement to eliminate manufacturing errors

Andrew Watts, Chet Huang, Yiyang Wang, Cuc Huynh, Craig Benson, Adam Smith

Proceedings Volume 6283, 628303 (2006) https://doi.org/10.1117/12.681730

KEYWORDS: Photomasks, Manufacturing, Control systems, Semiconducting wafers, Process control, Statistical analysis, Etching, Inspection, Error analysis, Yield improvement

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Proceedings Article | 20 May 2006 Paper

Influence of the pellicle on final photomask flatness

Richard Wistrom, Dennis Hayden, Kenneth Racette, Monica Barrett, Andrew Watts

Proceedings Volume 6283, 628326 (2006) https://doi.org/10.1117/12.681775

KEYWORDS: Pellicles, Photomasks, Adhesives, Distortion, Manufacturing, Optics manufacturing, Optical lithography, Lithography, Optical mounts, Reticles

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Proceedings Article | 8 November 2005 Paper

Implications of wafer design for manufacturing practices on photomask manufacturing

Andrew Watts, Jed Rankin, Christopher Magg

Proceedings Volume 5992, 599227 (2005) https://doi.org/10.1117/12.632418

KEYWORDS: Photomasks, Manufacturing, Optical proximity correction, Semiconducting wafers, Design for manufacturing, Inspection, Image processing, Semiconductor manufacturing, Yield improvement, SRAF

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Proceedings Article | 10 May 2005 Paper

Wavelength dependent mask defects

Karen Badger, Shahid Butt, Jay Burnham, Tom Faure, Michael Hibbs, Jed Rankin, David Thibault, Andrew Watts

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.601159

KEYWORDS: Photomasks, Inspection, Absorption, Microscopes, Lithography, Semiconducting wafers, Reflectivity, Glasses, Diagnostics, Opacity

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Proceedings Article | 24 May 2004 Paper

Mask line monitor: process improvements and yield learning

Yiyang Wang, Andrew Watts

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.536773

KEYWORDS: Inspection, Manufacturing, Etching, Image processing, Photoresist processing, Opacity, Yield improvement, Defect detection, Defect inspection, Standards development

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Proceedings Article | 17 December 2003 Paper

Migration of 90-nm mask and wafer lithography learning into 130-nm mask production to improve performance and yield

Andrew Watts, Yiyang Wang, Jed Rankin

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.517877

KEYWORDS: Photomasks, Lithography, Semiconducting wafers, Yield improvement, Manufacturing, Critical dimension metrology, Image processing, Mask making, Reactive ion etching, Etching

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Proceedings Article | 1 August 2002 Paper

Early mask results of KRS-XE and current progress in improving sensitivity and etch resistance

Christina Deverich, Andrew Watts, Paul Rabidoux, Thomas Cardinali, William Aaskov, Peter Levin, Wu-Song Huang, Wayne Moreau, Marie Angelopoulos, Karen Petrillo, David Madeiros

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476946

KEYWORDS: Photomasks, Etching, Opacity, Critical dimension metrology, Resistance, Chemically amplified resists, Packaging, Lithography, Temperature metrology, Mask making

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Proceedings Article | 1 August 2002 Paper

Investigating into mask contribution to device performance and chip functionality

Andrew Watts, Jed Rankin

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476931

KEYWORDS: Photomasks, Ultraviolet radiation, Deconvolution, Integrated circuits, Semiconducting wafers

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Proceedings Article | 1 August 2002 Paper

Comparing photomask and wafer post-develop defect formation

Adam Smith, William Aaskov, Stephen Knight, Robert Leidy, Andrew Watts

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.477006

KEYWORDS: Semiconducting wafers, Photomasks, Etching, Lithography, Photoresist materials, Photomicroscopy, Yield improvement, Photoresist developing, Polymers, Photoresist processing

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Showing 5 of 12 publications

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