Mr. Anton Haase Profile

Anton Haase

at Carl Zeiss SMT GmbH

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Author

Publications (7)

Proceedings Article | 24 March 2017 Paper

Investigating surface structures by EUV scattering

Victor Soltwisch, Christian Laubis, Analía Fernández Herrero, Mika Pflüger, Anton Haase, Frank Scholze

Proceedings Volume 10143, 101430P (2017) https://doi.org/10.1117/12.2258044

KEYWORDS: Scatterometry, Metrology, Extreme ultraviolet, X-rays, Grazing incidence, Scattering, Extreme ultraviolet lithography, High volume manufacturing, Process control, X-ray characterization, Diffraction, Diffraction gratings, Laser scattering, Monte Carlo methods

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Proceedings Article | 18 March 2016 Paper

Update on EUV radiometry at PTB

Christian Laubis, Annett Barboutis, Christian Buchholz, Andreas Fischer, Anton Haase, Florian Knorr, Heiko Mentzel, Jana Puls, Anja Schönstedt, Michael Sintschuk, Victor Soltwisch, Christian Stadelhoff, Frank Scholze

Proceedings Volume 9776, 977627 (2016) https://doi.org/10.1117/12.2218902

KEYWORDS: Extreme ultraviolet, Metrology, Extreme ultraviolet lithography, Radiometry, Reflectometry, Pellicles, Lifetime testing equipment, Mirrors, Optical filters, Spatial filters, Protactinium, Sensors

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Proceedings Article | 24 September 2015 Paper

Characterization of Mo/Si mirror interface roughness for different Mo layer thickness using resonant diffuse EUV scattering

Anton Haase, Victor Soltwisch, Frank Scholze, Stefan Braun

Proceedings Volume 9628, 962804 (2015) https://doi.org/10.1117/12.2191265

KEYWORDS: Scattering, Interfaces, Molybdenum, Extreme ultraviolet, Mirrors, Crystals, Laser scattering, Light scattering, Sensors, Reflectivity

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The throughput of extreme ultraviolet (EUV) lithography systems is presently strongly limited by the available radiant power at the wafer level. Besides increasing the power of EUV sources, also the quality of the optical elements plays a key role. With state of the art multilayer mirrors the main cause of diminished reflectance is surface and interface roughness as well as interface diffusion. Both properties lead to reduced specular reflectance while only the interface roughness causes diffuse scattering. EUV diffuse scatter thus allows to selectively assess the contribution of the interface roughness.

The intensity distribution of diffusely scattered EUV radiation provides information on vertical and lateral correlations of the surface and interface roughness through the appearance of resonant diffuse scattering (RDS) sheets. The study of off-specular scattering thus serves as a natural tool for the investigation of the roughness of the interfaces. However, upon near-normal incidence impinging EUV radiation, dynamical scattering contributions from thickness oscillations (Kiessig fringes) lead to Bragg lines which intersect the RDS sheets. This causes strong resonant enhancement in the scatter cross section which we called “Kiessig-like peak" in analogy to the well known phenomenon of Bragg-like peaks appearing in hard X-ray grazing incidence measurement geometries. Thus for power spectral density studies of multilayer interface roughness, resonant dynamical scattering cannot be neglected. Theoretical simulations based on the distorted-wave Born approximation enable to separate dynamic features of the multilayer from roughness induced scattering. This allows to consistently determine an interface power spectral density (PSD). We have analyzed magnetron sputtered high-reflectance Mo/Si multilayer mirrors with different nominal molybdenum layer thicknesses from 1.7 nm to 3.05 nm crossing the Mo crystallization threshold.

Our off-specular scattering measurements at multilayer samples were conducted at the PTB-EUV radiometry beamline at the Metrology Light Source (MLS) in Berlin. The samples were produced by magnetron sputtering and pre-characterized by K_α X-ray reflectivity at Fraunhofer IWS, Dresden.

Proceedings Article | 4 September 2015 Paper

Characterization of optical material parameters for EUV Lithography applications at PTB

Christian Laubis, Anton Haase, Victor Soltwisch, Frank Scholze

Proceedings Volume 9661, 96610W (2015) https://doi.org/10.1117/12.2195009

KEYWORDS: Extreme ultraviolet, Polarization, Reflectivity, Data modeling, Reticles, Mirrors, Diffraction, EUV optics, Extreme ultraviolet lithography, Photomasks

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Proceedings Article | 17 October 2014 Paper

Determination of line profiles on photomasks using DUV, EUV, and x-ray scattering

F. Scholze, B. Bodermann, S. Burger, J. Endres, A. Haase, M. Krumrey, C. Laubis, V. Soltwisch, A. Ullrich, J. Wernecke

Proceedings Volume 9231, 92310M (2014) https://doi.org/10.1117/12.2065941

KEYWORDS: Extreme ultraviolet, Deep ultraviolet, Scatterometry, Diffraction, X-rays, Diffraction gratings, Scattering, Photomasks, Polarization, Finite element methods

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Proceedings Article | 30 September 2014 Paper

Determination of line profiles on nano-structured surfaces using EUV and x-ray scattering

Victor Soltwisch, Jan Wernecke, Anton Haase, Jürgen Probst, Max Schoengen, Michael Krumrey, Frank Scholze, Jan Pomplun, Sven Burger

Proceedings Volume 9235, 92351D (2014) https://doi.org/10.1117/12.2066165

KEYWORDS: Scattering, Diffraction, X-rays, Extreme ultraviolet, Laser scattering, Silicon, Reflectivity, Finite element methods, Sensors, Scatterometry

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Proceedings Article | 2 April 2014 Paper

Nanometrology on gratings with GISAXS: FEM reconstruction and fourier analysis

Victor Soltwisch, Jan Wernecke, Anton Haase, Jürgen Probst, Max Schoengen, Michael Krumrey, Frank Scholze

Proceedings Volume 9050, 905012 (2014) https://doi.org/10.1117/12.2046212

KEYWORDS: Sensors, Finite element methods, Scattering, Silicon, X-rays, Laser scattering, Modulation, Scatterometry, Oxides, Grazing incidence

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Showing 5 of 7 publications

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