Mr. Benjamin L. Alles Profile

Benjamin L. Alles

at Advanced Mask Technology Ctr

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Author

Publications (2)

Proceedings Article | 19 May 2006 Paper

Pellicle-induced aberrations and apodization in hyper-NA optical lithography

Karsten Bubke, Benjamin Alles, Eric Cotte, Martin Sczyrba, Christophe Pierrat

Proceedings Volume 6283, 628318 (2006) https://doi.org/10.1117/12.681871

KEYWORDS: Pellicles, Apodization, Polarization, Photomasks, Sodium, Lithography, Monochromatic aberrations, Birefringence, Optical proximity correction, Dielectric polarization

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Proceedings Article | 15 March 2006 Paper

193-nm immersion photomask image placement in exposure tools

Eric Cotte, Benjamin Alles, Timo Wandel, Gunter Antesberger, Silvio Teuber, Manuel Vorwerk, Andreas Frangen, Frank Katzwinkel

Proceedings Volume 6154, 61541F (2006) https://doi.org/10.1117/12.656373

KEYWORDS: Photomasks, Image registration, Etching, Semiconducting wafers, Data analysis, Optical lithography, Lithography, Thermal effects, Electron beam lithography, Numerical simulations

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