The optical imaging properties of the eye are both determined by optical aberrations and deviations of the eye length. We report on a device for simultaneous measurement of aberrations and eye length combining a Shack Hartmann sensor and a short coherence interferometer. The short measurement duration minimizes disturbing influences like tear film or eye length changes. The low irradiance of the atient's eye minimizes exposure time.
Ar+ laser irradiation can produce change, most of the time decrease, in optical absorption of various electron beam deposited (EBD) dielectric thin films. Similar phenomena were also found in bulk materials prepared under high pressure and high temperature conditions. In this paper we report our recent progress in understanding the problem by employing a relaxation function which can fit the in-situ measured time dependent change in absorption of various dielectric thin films. Results of SiO2, TiO2, Ta2O5, ZrO2, HfO2 films and SiO2 bulk samples were reported and compared.
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