Mr. Colbert Lu Profile

Colbert Lu

Mask Expert at TMC

SPIE Involvement:

Author

Publications (12)

Proceedings Article | 20 November 2024 Poster + Paper

Productivity-enhanced mask inspection application for mature node coverage

Maxwel Lee, Eric Wang, Ken Yang, Colbert Lu, Elton Lin, Connie Lin, Pei-Ying Lin, Adrian Li, Dongsheng Fan

Proceedings Volume 13216, 132162B (2024) https://doi.org/10.1117/12.3034607

KEYWORDS: Inspection, Industry, Manufacturing, Semiconductors, Particles, Optical proximity correction, Lead, Artificial intelligence, Mask making, Reticles, Defect inspection, Optical inspection, Inspection equipment

Read Abstract +

Proceedings Article | 26 August 2024 Paper

Local registration (LREG) measurement for beam deflector monitoring

Chun Chieh Han, Yi Chen Chuang, Wei Shan Chen, Wen Wei Lee, Colbert Lu

Proceedings Volume 13177, 1317710 (2024) https://doi.org/10.1117/12.3032675

KEYWORDS: Image registration, Printing, Optical testing, Overlay metrology, Optical proximity correction, Metrology, Vestigial sideband modulation, Semiconducting wafers, Reticles, Photoresist materials

Read Abstract +

Proceedings Article | 26 September 2019 Paper

Characterization of quartz etched depth and optical density of opaque pattern for the wafer CD behavior on advanced mask

William Chou, Jeffrey Cheng, C. Twu, Adder Lee, Chih Hsuan Chao, Xin Ren Yu, Po Tsang Chen, Edgar Huang, Junjin Lin, Sweet Chen, James Cheng, Colbert Lu, Josh Tzeng, Jackie Cheng, Heng Jen Lee, Young Ham

Proceedings Volume 11148, 111481I (2019) https://doi.org/10.1117/12.2537938

KEYWORDS: Quartz, Photomasks, Critical dimension metrology, Semiconducting wafers, 3D metrology, Immersion lithography, Etching, Lithography, Binary data

Read Abstract +

Proceedings Article | 26 September 2019 Paper

Practical lithography hotspot identification using mask process model

Pai Chi Chen, Chain Ting Huang, Shang Feng Weng, Yung Feng Cheng, Young Ham, Colbert Lu, Michael Green, Mohamed Ramadan, Hong Jen Lee, Chris Progler

Proceedings Volume 11148, 111481H (2019) https://doi.org/10.1117/12.2537935

KEYWORDS: Lithography, Photomasks, Process modeling, Optical proximity correction, Semiconducting wafers, Machine learning, Resolution enhancement technologies, Source mask optimization, Critical dimension metrology, Computer simulations

Read Abstract +

Proceedings Article | 3 October 2018 Paper

Hotspot analysis and empirical correction through mask and wafer technology harmonization

Yohan Choi, William Chou, Jeffrey Cheng, C. H. Twu, Adder Lee, Chih Hsuan Chao, Hsin Fu Chou, Sweet Chen, James Cheng, Colbert Lu, Josh Tzeng, Jackie Cheng, Hong Jen Lee, Michael Green, Mohamed Ramadan, Young Ham, Chris Progler

Proceedings Volume 10810, 108101K (2018) https://doi.org/10.1117/12.2501427

KEYWORDS: Optical proximity correction, Photomasks, Lithography

Read Abstract +

Proceedings Article | 16 October 2017 Paper

Process window discovery from mask inspection for hotspot analysis and verification

James Cheng, William Chou, C. Twu, Hsin-Fu Chou, Jackie Cheng, Colbert Lu, Heng-Jen Lee, Bosheng Zhang, Mehdi Daneshpanah, Apo Sezginer, David Wu, Mike Yeh, Albert Chien

Proceedings Volume 10451, 104510X (2017) https://doi.org/10.1117/12.2281215

KEYWORDS: Photomasks, Inspection, Scanning electron microscopy, Lithography, 3D modeling, Near field, Photoresist materials, Semiconducting wafers

Read Abstract +

Proceedings Article | 4 October 2016 Paper

The CD control improvement by using CDSEM 2D measurement of complex OPC patterns

William Chou, Jeffrey Cheng, Adder Lee, James Cheng, Alex Tzeng, Colbert Lu, Ray Yang, Hong Jen Lee, Hideaki Bandoh, Izumi Santo, Hao Zhang, Chien Kang Chen

Proceedings Volume 9985, 99851M (2016) https://doi.org/10.1117/12.2241326

KEYWORDS: Photomasks, Critical dimension metrology, Optical proximity correction, Scanning electron microscopy, Semiconducting wafers, Manufacturing, Holons, Lithography, Edge roughness, Source mask optimization

Read Abstract +

Proceedings Article | 23 October 2015 Paper

In die mask overlay control for 14nm double-patterning lithography

William Chou, James Cheng, Alex Tseng, J. Wu, Chin Kuei Chang, Jeffrey Cheng, Adder Lee, Chain Ting Huang, N. Peng, Simon C. Hsu, Chun Chi Yu, Colbert Lu, Julia Yu, Peter Craig, Chuck Pollock, Young Ham, Jeff McMurran

Proceedings Volume 9635, 96351R (2015) https://doi.org/10.1117/12.2196794

KEYWORDS: Photomasks, Semiconducting wafers, Overlay metrology, Image registration, Double patterning technology, Lithography, Source mask optimization, Reticles, Pellicles, 193nm lithography

Read Abstract +

Proceedings Article | 20 October 2006 Paper

Utilize AIMS simulation to estimate profile side-wall angle

Colbert Lu, C. Lin, C. Wang

Proceedings Volume 6349, 634943 (2006) https://doi.org/10.1117/12.686469

KEYWORDS: Photomasks, Critical dimension metrology, Semiconducting wafers, Scanning electron microscopy, Etching, Chromium, Reticles, Lithography, Lutetium, Air contamination

Read Abstract +

Proceedings Article | 6 December 2004 Paper

AIMS-fab SPEC for defect repair and better repair profile

Colbert Lu, William Chou, Andy Cheng, J. Wu

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.581066

KEYWORDS: Semiconducting wafers, Photomasks, Inspection, Binary data, Critical dimension metrology, Atomic force microscopy, Etching, Manufacturing, Reticles, Quartz

Read Abstract +

Proceedings Article | 20 August 2004 Paper

CD uniformity improvement by loading effect correction (LEC) function for 90-nm reticle

Colbert Lu, Torey Huang, Shone Lee

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.562776

KEYWORDS: Etching, Critical dimension metrology, Photomasks, Reticles, Chromium, Data corrections, Modulation, Lutetium, Cadmium, Computed tomography

Read Abstract +

Proceedings Article | 27 December 2002 Paper

Advanced CD linearity improvement for multiproject wafers and SoC at 95-nm technology node

Jeremy Lu, Nicole Sandlin, Hidetoshi Sato, Colbert Lu, Nicole Cheng, Torey Huang, Clyde Su, Melisa Buie

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467750

KEYWORDS: Photomasks, Etching, System on a chip, Semiconducting wafers, Critical dimension metrology, Photoresist materials, Diffractive optical elements, Chlorine, Photoresist processing, Scanning electron microscopy

Read Abstract +

Showing 5 of 12 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years