Dr. D. Laurence Meixner Profile

Dr. D. Laurence Meixner

Director of R & D at Teledyne Scientific

SPIE Involvement:

Author

Publications (8)

SPIE Journal Paper | 1 July 2004

Porous silica frame for deep ultraviolet lithography

D. Laurence Meixner, Rahul Ganguli, Troy Robinson, De-Yin Jeng, Mark Morris, Satyabrata Chaudhuri, Brian Grenon

JM3, Vol. 3, Issue 03, (July 2004) https://doi.org/10.1117/12.10.1117/1.1758949

KEYWORDS: Silica, Pellicles, Aluminum, Sol-gels, Adsorption, Lithography, Nitrogen, Deep ultraviolet, Photomasks, Bioalcohols

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Proceedings Article | 17 December 2003 Paper

Sol-gel fabrication of high-quality photomask substrates for 157-nm lithography

Rahul Ganguli, Steven Colbern, Mark Morris, D. Laurence Meixner, S. Ray Chaudhuri

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518554

KEYWORDS: Glasses, Fluorine, Sol-gels, Photomasks, Silica, Chlorine, Birefringence, Lithography, Ultraviolet radiation, Oxidation

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Proceedings Article | 17 December 2003 Paper

Porous silica pellicle frame

De-Yin Jeng, D. Laurence Meixner, Rahul Ganguli, Steven Colbern, Troy Robinson, Mark Morris, S. Ray Chaudhuri, Brian Grenon

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518562

KEYWORDS: Silica, Pellicles, Photomasks, Adsorption, Sol-gels, Aluminum, Bioalcohols, Nitrogen, Contamination control, Quartz

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SPIE Journal Paper | 1 July 2003

Sol-gel fabrication of high-quality photomask substrates

Rahul Ganguli, D. Laurence Meixner, Steven Colbern, Matt Gleason, Douglas Meyers, Satyabrata Chaudhuri

JM3, Vol. 2, Issue 03, (July 2003) https://doi.org/10.1117/12.10.1117/1.1584686

KEYWORDS: Sol-gels, Photomasks, Glasses, Silica, Deep ultraviolet, Birefringence, Manufacturing, Lithography, Polishing, Ultraviolet radiation

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Proceedings Article | 26 June 2003 Paper

Porous silica frame for deep UV lithography

D. Meixner, Rahul Ganguli, Troy Robinson, De-Yin Jeng, Mark Morris, Satyabrata Chaudhuri, Brian Grenon

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485342

KEYWORDS: Silica, Photomasks, Pellicles, Sol-gels, Aluminum, Adsorption, Nitrogen, Lithography, Bioalcohols, Deep ultraviolet

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Proceedings Article | 26 June 2003 Paper

Sol-gel fabrication of high-quality photomask substrates

Rahul Ganguli, D. Meixner, Steve Colbern, Matt Gleason, Douglas Meyers, Satyabrata Chaudhuri

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485341

KEYWORDS: Sol-gels, Photomasks, Glasses, Silica, Fluorine, Deep ultraviolet, Birefringence, Optical lithography, Polishing, Manufacturing

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Proceedings Article | 27 December 2002 Paper

Porous silica frame for deep-UV lithography

D. Laurence Meixner, Rahul Ganguli, Troy Robinson, De-Yin Jeng, Mark Morris, S. Ray Chaudhuri, Brian Grenon

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468604

KEYWORDS: Silica, Photomasks, Pellicles, Sol-gels, Aluminum, Adsorption, Nitrogen, Lithography, Bioalcohols, Deep ultraviolet

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Proceedings Article | 27 December 2002 Paper

Sol-gel fabrication of high-quality photomask substrates

Rahul Ganguli, D. Laurence Meixner, Steven Colbern, Matt Gleason, Douglas Meyers, S. Ray Chaudhuri

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468605

KEYWORDS: Sol-gels, Photomasks, Glasses, Silica, Fluorine, Deep ultraviolet, Birefringence, Optical lithography, Manufacturing, Lithography

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Showing 5 of 8 publications

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