CONFERENCE PROCEEDINGS
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Daeyoup Lee
at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (5)
Proceedings Article | 27 March 2017 Paper
Study for new hardmask process scheme
Daeyoup Lee, Phillip Tatti, Richard Lee, Jack Chang, Winston Cho, Sanggil Bae
Proceedings Volume 10146, 101461L (2017) https://doi.org/10.1117/12.2258099
KEYWORDS: Optical alignment, Carbon, Etching, Optical lithography, System on a chip, Near infrared, Overlay metrology, Resistance, Lithography, Semiconducting wafers
Proceedings Article | 12 May 2005 Paper
Illumination and multi-step OPC optimization to enhance process margin of the 65nm node device exposed by dipole illumination
Soo-Han Choi, Tae-Hoon Park, Eunsung Kim, Hyoung-Joo Youn, Dae-Youp Lee, Yong-Chan Ban, A-Young Je, Dong-Hyun Kim, Ji-Suk Hong, Yoo-Hyon Kim, Moon-Hyun Yoo, Jeong-Taek Kong
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600249
KEYWORDS: Nanoimprint lithography, Photomasks, Optical proximity correction, Semiconducting wafers, Lithographic illumination, Lithography, Thin films, Scanners, Model-based design, SRAF
Proceedings Article | 22 August 2001 Paper
Control of resist flow process for sub-0.15-um small contact hole by latent image
Byung-Kap Kim, Suk-Joo Lee, Dae-Yup Lee, Jeong-Woo Lee, Jeong-Lim Nam
Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436755
KEYWORDS: Image processing, Photomasks, Chromium, Radiofrequency ablation, Photoresist processing, Critical dimension metrology, Phase shifts, Glasses, Microfluidics, Control systems
Proceedings Article | 22 August 2001 Paper
Method for prevention of unopened contact hole in dual-damascene process
Gyu-Ho Lyu, Chang-Hwan Kim, Suk-Joo Lee, Hee-Hong Yang, Dae-Yup Lee, Ji-Yong Yoo, Jeong-Woo Lee, Yoo-Hyon Kim, Jeong-Lim Nam, Woo-Sung Han
Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436747
KEYWORDS: Critical dimension metrology, Absorption, Photoresist materials, Deep ultraviolet, Photoresist processing, Resistance, Etching, Copper, Optical lithography, Reflection
Proceedings Article | 24 July 1996 Paper
Fabrication of dense contact patterns using halftone phase-shifting mask with off-axis illumination
Hyoungjoon Kim, Jongwook Kye, Dae-Yup Lee, Sang-Gyun Woo, Hoyoung Kang, Young-Bum Koh
Proceedings Volume 2793, (1996) https://doi.org/10.1117/12.245224
KEYWORDS: Photomasks, Semiconducting wafers, Phase shifts, Lithographic illumination, Halftones, Printing, Deep ultraviolet, Lithography, Optical lithography, Wafer-level optics
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