Dr. Daniel S. Abrams Profile

Dr. Daniel S. Abrams

CEO

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 30 October 2007 Paper

Inverse lithography technology (ILT): keep the balance between SRAF and MRC at 45 and 32 nm

Linyong Pang, Yong Liu, Thuc Dam, Kresimir Mihic, Thomas Cecil, Dan Abrams

Proceedings Volume 6730, 673052 (2007) https://doi.org/10.1117/12.754568

KEYWORDS: Photomasks, SRAF, Semiconducting wafers, Lithography, Optical proximity correction, Diffraction, Inverse problems, Phase shifts, Resolution enhancement technologies, Manufacturing

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Proceedings Article | 15 May 2007 Paper

Inverse lithography technology (ILT): a natural solution for model-based SRAF at 45-nm and 32-nm

Linyong Pang, Yong Liu, Dan Abrams

Proceedings Volume 6607, 660739 (2007) https://doi.org/10.1117/12.729028

KEYWORDS: Photomasks, SRAF, Semiconducting wafers, Optical proximity correction, Lithography, Inverse problems, Phase shifts, Diffraction, Model-based design, Resolution enhancement technologies

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Proceedings Article | 20 October 2006 Paper

Inverse lithography technology at low k1: placement and accuracy of assist features

Andrew Moore, Timothy Lin, Yong Liu, Gordon Russell, Linyong Pang, Daniel Abrams

Proceedings Volume 6349, 63494T (2006) https://doi.org/10.1117/12.693039

KEYWORDS: Photomasks, SRAF, Lithography, Semiconductors, Manufacturing, Computer simulations, Phase shifts, Tolerancing, Resolution enhancement technologies, Chemical elements

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Proceedings Article | 20 May 2006 Paper

Inverse lithography technology (ILT): What is the impact to the photomask industry?

Linyong Pang, Yong Liu, Dan Abrams

Proceedings Volume 6283, 62830X (2006) https://doi.org/10.1117/12.681857

KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Lithography, Manufacturing, Inspection, Vestigial sideband modulation, Mask making, Deep ultraviolet, Inverse optics

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Proceedings Article | 15 March 2006 Paper

Fast inverse lithography technology

Daniel Abrams, Linyong Pang

Proceedings Volume 6154, 61541J (2006) https://doi.org/10.1117/12.658876

KEYWORDS: Photomasks, Lithography, Semiconducting wafers, Manufacturing, Binary data, Inverse problems, SRAF, Optical proximity correction, Inverse optics, Diffraction

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Proceedings Article | 8 November 2005 Paper

Inverse lithography technology principles in practice: unintuitive patterns

Yong Liu, Dan Abrams, Linyong Pang, Andrew Moore

Proceedings Volume 5992, 599231 (2005) https://doi.org/10.1117/12.632366

KEYWORDS: Photomasks, Optical proximity correction, Lithography, Image segmentation, Image quality, Resolution enhancement technologies, Manufacturing, Semiconductors, Printing, Inverse optics

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Proceedings Article | 8 November 2005 Paper

Laser and e-beam mask-to-silicon with inverse lithography technology

Linyong Pang, Nader Shamma, Paul Rissman, Dan Abrams

Proceedings Volume 5992, 599221 (2005) https://doi.org/10.1117/12.632738

KEYWORDS: Photomasks, Semiconducting wafers, Optical proximity correction, Lithography, Vestigial sideband modulation, Scanning electron microscopy, Image segmentation, Deep ultraviolet, Binary data, Optical simulations

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Proceedings Article | 16 May 2003 Paper

Quantum lithography

Samuel Braunstein, Agedi Boto, Pieter Kok, Daniel Abrams, Colin Williams, Jonathan Dowling

Proceedings Volume 5111, (2003) https://doi.org/10.1117/12.497420

KEYWORDS: Photons, Lithography, Diffraction, Optical lithography, Photomasks, Interferometry, Quantum computing, Geometrical optics, Genetic algorithms, Entangled states

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Showing 5 of 8 publications

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