We introduce an inverted refractive-index-contrast grating (ICG) that is a compact alternative to DBRs. In ICG a subwavelength grating made of a low refractive index material is implemented on a high refractive index cladding. We experimentally demonstrate high reflectivity of proof-of-concept ICG fabricated by 3D microprinting, in which IP-Dip photoresist grating is deposited on silicon cladding. We also show that the ICG provides nearly total optical power reflectance whenever the refractive index of the grating exceeds 1.75, irrespective of the refractive index of the cladding.
In this paper, the design and preparation of polymer based monolithic high-contrast grating (MHCG) structures and their Talbot self-imaging effect are presented. For the preparation of MHCG structures to IP-Dip negative photoresist material, 3D laser lithography was used. The shape and morphological properties of the prepared MHCG structure were investigated by scanning electron microscope (SEM). Finally, the highly resolved near-field scanning optical microscope (NSOM) for the vertical optical field distribution over the grating structure was used. The demonstration of the Talbot effect for different wavelengths in a diffraction and a subwavelength regime is presented theoretically and experimentally from NSOM measurements.
Photonics has become recently an intensively evolving area, where the possibilities of photonic structures or crystals (PhC) for integrated optoelectronics were found. An employment of three dimensional (3D) laser technology with combination of stable polymer resin enable printing of micro-optical and nano-optical components or other type diffractive structures for optoelectronic applications. In this paper, we demonstrate possibilities of 3D laser technology based on two photon polymerization for application in optoelectronics. We prepared two types of 3D polymer photonic structures, which was proposed for direct application on light emitting diode chip. We designed and fabricated Kagome and square lattice structures in 3D arrangement and we analyzed their properties in scanning electron microscope and by diffraction measurements.
We proposed, simulated and fabricated a new type of three-dimensional (3D) optical splitter based on multimode interference (MMI). Splitter was designed for the wavelength of 1550 nm and the input signal is divided into 9 outputs. The multimode waveguide part of the splitter was designed as a block with square basis of cross-section of 26 x 26 μm2 and length of 211 μm. We used the IP-Dip polymer as a standard material for 3D laser lithography. We present the design, simulated and measured optical field distribution in the output of the MMI splitter and its direct integration on the single mode optical fiber.
In this paper, we present inverted pyramids patterned in the surface of IP-Dip polymer that can be used as a SERS substrate. Inverted pyramids are prepared using direct laser writing lithography and they are metal-coated in the next step. Prepared SERS structure consists of field of 40x40 pyramids with base of 3 μm and two depths – 2 and 3 μm. Afterwards, an Au layer with 4 different thicknesses (10 nm, 20 nm, 30 nm and 40 nm) is evaporated. Transmission spectra were simulated and measured for characterization of prepared structures. The micro-Raman measurements using Rhodamine 6G in aqueous solution at concentration of 10-2 M as the probe molecule were performed.
We present experimental verification of tree-dimensional (3D) 1x4 Y-branch splitter based on IP-Dip polymer as a core and polydimethylsiloxane (PDMS) Sylgard 184 as a cladding. The splitter was designed to operate in a wavelength region around 1550 nm. The design parameters of the splitter were optimized according to required optical properties and technological limitations. Based on the simulation results, the 3D Y-branch splitter was realized using direct laser writing lithography. Cladding of the splitter was prepared by PDMS pouring and curing. The measurements were performed by coupling optical signal into the splitter using standard SM fiber. By intensity monitoring of CCD camera we successfully documented splitting of the input optical signal into four output signals.
This contribution presents special polymer-based 3D structures that were prepared via dip in laser lithography using Nanoscribe Photonic Professional 3D lithography system. As 3D structures, three different arrangements of microcones were performed: microcone decorated with in-line protrusions with two different periods (400 nm and 1 μm), and microcone with protrusions arranged in spiral. After that, 10 nm of Ag was evaporated onto the prepared samples. The micro-Raman measurements for Rhodamine 6G as a probe molecule show usability of metal-coated IP-Dip structures for surface-enhanced Raman spectroscopy.
In this paper we demonstrate possibilities of three-dimensional (3D) printing technology based on two-photon polymerization for application in optoelectronics and optical sensing applications. We use three-dimensional laser lithography based on direct-laser-writing (DLW) for fabrication of 3D polymeric microstructural device integrated at the end of optical fiber. The microstructure consist of mechanical holder and ring resonator as microoptical photonic device. Such 3D photonic device integrated at the end of optical fiber can work as fiber probe for optical sensing.
In this paper, we present design and preparation of polymer components for microspectrometer fabrication on a chip. The graphical program was used to design novel components in 3D arrangement. In experimental we used two-photon polymerization for direct laser writing of designed structures in IP-Dip photoresist material. Shape and morphological properties of prepared devices were investigated by scanning electron microscope (SEM). Finally, optical properties were examined by diffraction measurements.
Progress in nanotechnologies accelerated the polymer based photonics, where simple and cheap solutions often bring comparable and sometimes also novel interesting results. Good candidates are polymer photoresists and siloxane materials with unique mechanical and optical properties. We present laser lithography as efficient tool for fabrication of different three-dimensional (3D) structures embedded in polydimethylsiloxane (PDMS) membranes. Presented concept of PDMS based thin membranes with 3D structures works as an effective diffraction element for modification of radiation pattern diagram of light emitting diodes and changes also the angular photoresponse of photodiodes. All these results were demonstrated on two types of 3D structures – spheres arranged in cubic lattice and woodpile structure.
In this paper, the fabrication method of waveguide structures and devices as ring resonators for different waveguide applications based on polymer material is presented. The structures were designed in computer-aided design (CAD) software and two-photon polymerization lithography system was used for preparation of desired devices. Morphological properties of prepared devices were investigated using scanning electron microscope (SEM) and confocal microscope. Finally, we performed measurement of optical spectrum characteristics in telecommunication wavelengths range. The results corresponds to calculated parameters. Final polymer devices are promising for lab on a chip and sensing applications due to unique elastic and chemical properties.
In this contribution, we present modification of far field of light emitting diode (LED) with implemented Fresnel structure in the LED surface. Fresnel structures were prepared in one-dimensional arrangement with two different foci f1 = 12.5 μm and f2 = 1 cm. Structures were etched directly in the LED emitting surface using electron beam lithography with the etched depth for the structure with f1 and f2 app. 200 nm and 400 nm, respectively. Due to application of these structures, LED far field narrowing was observed, which is documented by goniophotometer measurements. For the structure with f1 and f2, the intensity decrease for angles ±30° – ±50° is app. 3-4% and 5-6%, respectively, in comparison to the Lambertian profile.
KEYWORDS: Resonators, Lithography, Waveguides, 3D metrology, Mirrors, Scanning electron microscopy, Optical properties, Single mode fibers, Photonic devices, Two photon polymerization, Polymers, Photoresist materials, Sensing systems
In this paper we demonstrate design and fabrication of two- (2D) and three-dimensional (3D) ring resonators prepared by 3D laser lithography based on two photon polymerization. We used dip-in direct-laser-writing (DLW) optical lithography to fabricate 3D optical structures for optics and optoelectronics. Prepared structures are embedded in polydimethylsiloxane, which is well known silicon elastomer with unique mechanical and optical properties. This polymer structure allows to couple light directly from single mode optical fiber to the ring resonator structure, where polydimethylsiloxane creates cladding. Optical properties of prepared 2D and 3D ring resonators were investigated by measurement of transmission spectral characteristics.
In this paper we demonstrate possibilities of three-dimensional (3D) printing technology based on two photon polymerization. We used three-dimensional dip-in direct-laser-writing (DLW) optical lithography to fabricate 2D and 3D optical structures for optoelectronics and for optical sensing applications. DLW lithography allows us use a non conventional way how to couple light into the waveguide structure. We prepared ring resonator and we investigated its transmission spectral characteristic. We present 3D inverse opal structure from its design to printing and scanning electron microscope (SEM) imaging. Finally, SEM images of some prepared photonic crystal structures were performed.
This contribution presents implementation of one dimensional Fresnel structure in surface emitting part of the AlGaAs/GaAs multi-quantum well light emitting diode (LED).The structure consists in drilled lines distributed with square root of distance in order to obtain structures with different foci. First structure was prepared by electron beam lithography and etched directly in the emitting surface using reactive-ion etching. Second structure was prepared in the surface of thin PDMS membrane that can be stack directly on the emitting surface. The membrane is fabricated using dip in laser lithography combined with PDMS embossing. Implementation of such Fresnel structures leads in modification of LED far-field what was proved by goniophotometer measurements.
In this paper we present fabrication process of waveguides with surface relief Bragg grating (SR-BG) embossed in poly dimethyl diphenyl siloxane (PDMDPS). Generally, the Bragg grating causes spectral selectivity of propagated light in optical fibers and optical waveguides. We prepared the original concept of fabrication of novel optical waveguides with SR-BG using the laser interference lithography in combination with embossing process of liquid polymer. We used laser interference lithography in Mach-Zehnder configuration to create a grating with period of 21 μm in thin photoresist layer. In this manner, we created an array of D-shaped waveguides of 10 μm wide and app. 2.5 μm high. SR-BG was created in the next step, where the one dimensional surface Bragg grating with period 1.64 μm was prepared by interference lithography. This period was designed to reflect narrow spectral band close the telecommunication wavelength of 1.55 μm. Quality of the prepared waveguides and SR-BG was confirmed from atomic force microscope analysis. Transmission and coupling properties of the prepared SR-BG waveguides were finally measured by spectral measurements in infrared spectral region.
In this paper we present preparation process of ring resonator in racetrack configuration based on polydimethylsiloxane (PDMS). 3D laser lithography in combination with imprinting technique was used to pattern photoresist layer as a master for imprinting process. In the next step, PDMS ring resonator was imprinted and filled with core PDMS. Finally, morphological properties of prepared device were investigated by scanning electron microscope (SEM) and confocal microscope and transmission spectrum measurements were performed.
Polymer based photonics brings simple and cheap solutions often with interesting results. We present capabilities of some siloxanes focusing on polydimethylsiloxane (PDMS) with unique mechanical and optical properties. In combination of laser lithography technologies with siloxane embossing we fabricate different grating structures with one- and two-dimensional symmetry. Concept of PDMS based thin membranes with patterned surface as an effective diffraction element for modification of radiation pattern diagram of light emitting diodes is here shown. Also the PDMS was used as an alternative material for fabrication of complicated waveguide with implemented Bragg grating. For lab-on-chip applications, we patterned PDMS microstructures for microfluidic and micro-optic devices.
We describe new technologies for a fabrication of microfluidics and micro-optics components for lab-on-a-chip applications based on polydimethylsiloxane. We use combination of direct laser writing (DLW) lithography for channel patterning in photoresist layer with PDMS imprinting process. Unique imprinting and optical properties favors PDMS for fabrication of different microchannels and microlens arrays. This technology allows the fabrication of different PDMS channel structures. Also PDMS based microlens arrays were patterned in photoresist layer by DLW process and also by interference lithography and imprinted in PDMS layer. Spontaneous microlens array based on polystyrene microspheres was also prepared by spin-coating of dispersed microspheres in photoresist and for organized microlens array we used predefined two-dimensional grid prepared by interference lithography. Final structures were investigated by confocal and optical microscope. The prepared PDMS and polystyrene based microdevices can be used in lab-on-a-chip applications in sensing and biological measurements.
This contribution demonstrates surface modification of thin photoresist layers and polydimethylsiloxane (PDMS) surfaces with spatial resolution better than 20 nm. We provided few different 2D arrangements of surface patterning with aim to prepare 2D photonic structures with various symmetries in the thin S1828 photoresist layer using AFM lithography. Consequently, we used the imprinting technique for transferring the photoresist pattern to the PDMS membrane surface. Finally, prepared 2D photonic structures in photoresist and PDMS surfaces are characterized by AFM.
In this paper, capabilities of the fabrication technology for planar waveguide structures and devices in polydimethylsiloxane (PDMS) are presented. Direct laser writing in combination with imprinting technique was used to pattern photoresist layer as a master for imprinting process. In the next step, PDMS waveguide structures as channel waveguide, Y-branch waveguide splitter and ring resonator were imprinted. Finally, optical and morphological properties of prepared devices were investigated by confocal microscopy and atomic force microscopy.
We describe fabrication process of optical waveguide structures such as multi-mode optical splitter and optical waveguide with surface Bragg grating in polydimethylsiloxane (PDMS). Technology based on drawing of thin photoresist fiber with diameter up to 100 μm was developed and optimized. In this way, fibers drawn from photoresist form cores of waveguides in PDMS slab. After removal of the photoresist, created air channels can be filled in with different liquids. We prepared multimode waveguide structures in PDMS composed of two PDMS materials with different refractive indices. Using this technology, also complicated waveguide structures were prepared as optical splitter and surface Bragg grating were prepared in PDMS material.
Dusan Pudis, Pavol Hronec, Jaroslav Kovac, Ivana Lettrichova, Jaroslava Skriniarova, Daniel Jandura, Sofia Slabeyciusova, Lubos Suslik, Jozef Novak, Anton Kuzma
KEYWORDS: Light emitting diodes, Lithography, Near field scanning optical microscopy, Photoresist materials, Optical lithography, Photonics, Near field optics, Optoelectronic devices, Near field, Optical microscopes
Implementation of planar surface structures allows enhancement of light extraction from the light emitting diode (LED) surface due to diffraction-on-roughness based effect and photonic-band gap effect. Application of such structures can be attractive for overall and local enhancement of light from patterned areas of the LED surface. We used interference and near-field scanning optical microscope lithography for patterning of the surface of GaAs/AlGaAs based LEDs emitted at 840 nm. Also new approach with patterned polydimethylsiloxane (PDMS) membrane applied directly in the LED surface was investigated. Technology of patterned PDMS membranes using interference lithography and imprinting process was developed. The overall emission properties of prepared LED with patterned structure show enhanced light extraction efficiency, what was documented from near- and far-field measurements.
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