Dr. Dave Balachandran Profile

Dr. Dave Balachandran

at SUNY Poly SEMATECH

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 6 April 2015 Paper

SEMATECH produces defect-free EUV mask blanks: defect yield and immediate challenges

Alin Antohe, Dave Balachandran, Long He, Patrick Kearney, Anil Karumuri, Frank Goodwin, Kevin Cummings

Proceedings Volume 9422, 94221B (2015) https://doi.org/10.1117/12.2176126

KEYWORDS: Photomasks, Extreme ultraviolet, Inspection, Extreme ultraviolet lithography, Silica, Deposition processes, Standards development, Manufacturing, Ruthenium, Reflectivity

Read Abstract +

Proceedings Article | 17 April 2014 Paper

Effect of cleaning and storage on quartz substrate adhesion and surface energy

Dave Balachandran, Arun John

Proceedings Volume 9048, 90480N (2014) https://doi.org/10.1117/12.2048310

KEYWORDS: Humidity, Quartz, Chemistry, Capillaries, Particles, Extreme ultraviolet, Extreme ultraviolet lithography, Atomic force microscope, Photomasks, Inspection

Read Abstract +

Proceedings Article | 2 April 2014 Paper

Comparative defect classifications and analysis of Lasertec's M1350 and M7360

Milton Godwin, Dave Balachandran, Tomoya Tamura, Anwei Jia

Proceedings Volume 9050, 90502Z (2014) https://doi.org/10.1117/12.2047659

KEYWORDS: Particles, Inspection, Reflectivity, Scanning electron microscopy, Defect detection, Extreme ultraviolet, Failure analysis, Statistical analysis, Crystals, Signal detection

Read Abstract +

Proceedings Article | 18 March 2014 Paper

Mitigation of EUV mask blank substrate pit and scratch defects by Accelerated Neutral Atom Beam (ANAB) processing

M. Walsh, K. Chau, S. Kirkpatrick, R. Svrluga, B. Piwczyk, F. Goodwin, D. Balachandran

Proceedings Volume 9048, 90480I (2014) https://doi.org/10.1117/12.2046686

KEYWORDS: Chemical species, Extreme ultraviolet, Photomasks, Sputter deposition, Surface roughness, Argon, Surface finishing, Ions, Polishing, Chemical mechanical planarization

Read Abstract +

Proceedings Article | 23 September 2013 Paper

Ultra-low roughness magneto-rheological finishing for EUV mask substrates

Paul Dumas, Richard Jenkins, Chuck McFee, Arun Kadaksham, Dave Balachandran, Ranganath Teki

Proceedings Volume 8880, 888005 (2013) https://doi.org/10.1117/12.2026372

KEYWORDS: Polishing, Magnetorheological finishing, Extreme ultraviolet, Surface finishing, Chemical mechanical planarization, Particles, Photomasks, Surface roughness, Extreme ultraviolet lithography, Inspection

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years