Dr. David Nijkerk Profile

Dr. David Nijkerk

Optical Designer at TNO Science and Industry

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Author

Publications (12)

Proceedings Article | 19 October 2023 Presentation + Paper

Compact NO2 plume detection instrument for concurrent observations of NO2 and CO2

David Nijkerk, Emanuela Palombo, Nurcan Alpay Koc, Anton Leemhuis

Proceedings Volume 12735, 1273509 (2023) https://doi.org/10.1117/12.2679923

KEYWORDS: Equipment, Mirrors, Spectroscopy, Design and modelling, Telescopes, Imaging systems, Tolerancing, Nitrogen dioxide, Manufacturing, Carbon dioxide

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Proceedings Article | 12 July 2019 Open Access

Freeform optics design tool for compact spectrometers

M. David Nijkerk, J. Michael Gruber, Bart Boonacker

Proceedings Volume 11180, 1118022 (2019) https://doi.org/10.1117/12.2535993

KEYWORDS: Optical design, Code v, Freeform optics, Spectrometers, Optimization (mathematics), Tolerancing, Mirrors, Imaging systems, Ray tracing, Interfaces

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Proceedings Article | 5 January 2018 Open Access

Freeform design and fabrication: Where the proof of the pudding is in verification

M. Nijkerk, O. Van der Togt-Marinescu, G. Gubbels

Proceedings Volume 10565, 1056526 (2018) https://doi.org/10.1117/12.2309177

KEYWORDS: Tolerancing, Telescopes, Mirrors, Optics manufacturing, Space telescopes, Manufacturing, Polishing, Optical spheres, Surface finishing, Astronomical imaging

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Proceedings Article | 20 November 2017 Open Access

The TROPOMI Telescope

David Nijkerk, Bart van Venrooy, Peter Van Doorn, Rens Henselmans, Folkert Draaisma, André Hoogstrate

Proceedings Volume 10564, 105640Z (2017) https://doi.org/10.1117/12.2309035

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Proceedings Article | 22 February 2017 Paper

Impact of design-parameters on the optical performance of a high-power adaptive mirror

Wouter Koek, David Nijkerk, Jeroen Smeltink, Teun van den Dool, Erwin van Zwet, Gregor van Baars

Proceedings Volume 10097, 1009704 (2017) https://doi.org/10.1117/12.2249739

KEYWORDS: Optical design, Actuators, Adaptive optics, Deformable mirrors, Mirrors, High power lasers, Received signal strength, Extreme ultraviolet, Spatial frequencies, Wavefronts

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Proceedings Article | 23 September 2015 Paper

Spectrometry: photon sorting at the speed of light

H. Vink, J. Day, J.B. Volatier, M. Nijkerk

Proceedings Volume 9626, 96261L (2015) https://doi.org/10.1117/12.2191294

KEYWORDS: Spectroscopy, Mirrors, Telescopes, Space telescopes, Manufacturing, Optical design, Polarization, Silicon, Coating, Imaging systems

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Proceedings Article | 13 September 2012 Paper

Design, analysis, and testing of the optical tube assemblies for the ESO VLT four laser guide star facility

R. Henselmans, D. Nijkerk, M. Lemmen, N. Rijnveld, F. Kamphues

Proceedings Volume 8447, 84474N (2012) https://doi.org/10.1117/12.926484

KEYWORDS: Laser guide stars, Wavefronts, Mirrors, Optical fabrication, Adaptive optics, Analytical research, Laser development, Telescopes, Polarization, High power lasers

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Proceedings Article | 10 November 2011 Paper

Athermal design of the optical tube assemblies for the ESO VLT Four Laser Guidestar Facility

R. Henselmans, D. Nijkerk, M. Lemmen, F. Kamphues

Proceedings Volume 8336, 83360X (2011) https://doi.org/10.1117/12.916127

KEYWORDS: Temperature metrology, Solid modeling, Laser guide stars, Optical design, Thermal modeling, Optical fabrication, Adaptive optics, Wavefronts, Integrated modeling, Beam expanders

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Proceedings Article | 13 September 2011 Paper

Athermal design of the optical tube assemblies for the ESO VLT Four Laser Guidestar Facility

R. Henselmans, D. Nijkerk, M. Lemmen, N. Rijnveld, F. Kamphues

Proceedings Volume 8149, 814905 (2011) https://doi.org/10.1117/12.893845

KEYWORDS: Laser guide stars, Wavefronts, Mirrors, Optical design, Adaptive optics, Optical fabrication, Temperature metrology, Beam expanders, Manufacturing, Carbon

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Proceedings Article | 23 March 2010 Paper

Holographic method for detecting amplitude and phase-shift errors and features in EUV ML reticle blanks

David Nijkerk, Norbert Koster, Eddy van Brug, Diederik Maas

Proceedings Volume 7636, 763622 (2010) https://doi.org/10.1117/12.846505

KEYWORDS: Reticles, Inspection, Multilayers, Extreme ultraviolet lithography, Reflectivity, Semiconducting wafers, Photomasks, Extreme ultraviolet, Photoresist materials, Thin films

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Proceedings Article | 22 March 2007 Paper

Simulation of the combined effects of polymer size, acid diffusion length, and EUV secondary electron blur on resist line-edge roughness

D. Drygiannakis, M. Nijkerk, G. Patsis, G. Kokkoris, I. Raptis, L. Leunissen, E. Gogolides

Proceedings Volume 6519, 65193T (2007) https://doi.org/10.1117/12.708847

KEYWORDS: Diffusion, Line width roughness, Line edge roughness, Etching, Stochastic processes, Photons, Polymers, Critical dimension metrology, Molecules, Extreme ultraviolet

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Proceedings Article | 16 June 2003 Paper

Wafer alignment with backscatter electron detection

Hans Gijsbertsen, David Nijkerk, Giljam Derksen, Patrick de Jager, Stefan Keij, Maurits van der Schaar

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484962

KEYWORDS: Optical alignment, Backscatter, Semiconducting wafers, Aluminum, Scanning electron microscopy, Electron beams, Photography, Copper, Optical correlators, Sensors

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Showing 5 of 12 publications

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