Dr. Dong-Hyun Kim Profile

Dr. Dong-Hyun Kim

at Samsung Electronics Co Ltd

SPIE Involvement:

Author

Publications (9)

Proceedings Article | 29 May 2007 Paper

Stray-light implementation in optical proximity correction (OPC)

Young-Chang Kim, Donghyun Kim, Insung Kim, Sangwook Kim, Sungsoo Suh, Yong-Jin Chun, Sukjoo Lee, Junghyeon Lee, Chang-Jin Kang, Jootae Moon, Kunal Taravade, Sooryong Lee

Proceedings Volume 6607, 66071M (2007) https://doi.org/10.1117/12.728969

KEYWORDS: Optical proximity correction, Stereolithography, Stray light, Convolution, Photomasks, Modulation transfer functions, Spatial light modulators, Semiconducting wafers, Image quality, Critical dimension metrology

Read Abstract +

Proceedings Article | 20 March 2006 Paper

Efficient OPC model generation and verification for focus variation

Yong-Hee Park, Yong-Chan Ban, Duck-Hyung Hur, Dong-Hyun Kim, Ji-Suk Hong, Moon-Hyun Yoo, Jeong-Taek Kong

Proceedings Volume 6154, 61543B (2006) https://doi.org/10.1117/12.656762

KEYWORDS: Optical proximity correction, Data modeling, Model-based design, Lithography, Photomasks, Semiconducting wafers, Optical lithography, Instrument modeling, Critical dimension metrology, Algorithms

Read Abstract +

Proceedings Article | 12 May 2005 Paper

Illumination and multi-step OPC optimization to enhance process margin of the 65nm node device exposed by dipole illumination

Soo-Han Choi, Tae-Hoon Park, Eunsung Kim, Hyoung-Joo Youn, Dae-Youp Lee, Yong-Chan Ban, A-Young Je, Dong-Hyun Kim, Ji-Suk Hong, Yoo-Hyon Kim, Moon-Hyun Yoo, Jeong-Taek Kong

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600249

KEYWORDS: Nanoimprint lithography, Photomasks, Optical proximity correction, Semiconducting wafers, Lithographic illumination, Lithography, Thin films, Scanners, Model-based design, SRAF

Read Abstract +

Proceedings Article | 5 May 2005 Paper

New OPC methods to increase process margin for sub-70nm devices

Ji-Suk Hong, Dong-Hyun Kim, Sang-Wook Kim, Moon-Hyun Yoo, Jeong-Taek Kong

Proceedings Volume 5756, (2005) https://doi.org/10.1117/12.600231

KEYWORDS: Optical proximity correction, Model-based design, Lithography, Optical lithography, Nanoimprint lithography, Process modeling, Data modeling, Semiconducting wafers, Scanning electron microscopy, Photomasks

Read Abstract +

Proceedings Article | 28 May 2004 Paper

Accurate gate CD control through the full-chip area using the dual model in the model-based OPC

Ji-Suk Hong, Chul-Hong Park, Dong-Hyun Kim, Soo-Han Choi, Yong-Chan Ban, Yoo-Hyon Kim, Moon-Hyun Yoo, Jeong-Taek Kong

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535027

KEYWORDS: Optical proximity correction, Data modeling, Model-based design, Critical dimension metrology, Instrument modeling, Etching, Process modeling, Lithography, Calibration, Error analysis

Read Abstract +

Proceedings Article | 28 May 2004 Paper

Simulation-based critical-area extraction and litho-friendly layout design for low k1 lithography

Soo-Han Choi, Yong-Chan Ban, Ki-Heung Lee, Dong-Hyun Kim, Ji-Suk Hong, Yoo-Hyon Kim, Moon-Hyun Yoo, Jeong-Taek Kong

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535008

KEYWORDS: Optical proximity correction, Lithography, Solid modeling, Photomasks, Image processing, Critical dimension metrology, Nanoimprint lithography, Semiconducting wafers, Electroluminescence, SRAF

Read Abstract +

Proceedings Article | 26 June 2003 Paper

Hybrid PPC methodology using multistep correction and implementation for the sub-100-nm node

Soo-Han Choi, Ji-Soong Park, Chul-Hong Park, Won-Young Chung, In-sung Kim, Dong-Hyun Kim, Yoo-Hyon Kim, Moon-Hyun Yoo, Jeong-Taek Kong

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485397

KEYWORDS: SRAF, Etching, Critical dimension metrology, Logic devices, Process control, Process modeling, Semiconductors, Control systems, Plasma, Instrument modeling

Read Abstract +

Proceedings Article | 30 July 2002 Paper

Hybrid PPC methodology and implementation in the correction of etch proximity

Chul-Hong Park, Sang-Uhk Rhie, Soo-Han Choi, Dong-Hyun Kim, Ji-Soong Park, Yoo-Hyon Kim, Moon-Hyun Yoo, Jeong-Taek Kong

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474586

KEYWORDS: Critical dimension metrology, Etching, Model-based design, Instrument modeling, Performance modeling, Image segmentation, Data modeling, Cadmium, Data corrections, Lithography

Read Abstract +

Proceedings Article | 11 March 2002 Paper

Robust and fast OPC approach for metal interconnects of 0.13um logic devices

Ji-Soong Park, Dong-Hyun Kim, Chul-Hong Park, Yoo-Hyon Kim, Moon-Hyun Yoo, Jeong-Taek Kong, Hyun-Woo Kim, Sun-Il Yoo

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458275

KEYWORDS: Optical proximity correction, Metals, Logic devices, Optical alignment, Photomasks, Resistance, Bridges, Reliability, Scanners, Overlay metrology

Read Abstract +

Showing 5 of 9 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years