Efrat Noifeld
at Applied Materials Israel, Ltd
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 8 April 2019 Paper
R. Kris, G. Klebanov, I. Schwarzband, E. Sommer, L. Gershtein, B. Mathew, E. Noifeld, S. Levy, R. Alkoken, O. Novak, H. Miroku, D. Rathore , S. Pastur, S. Duvdevani-Bar, T. Bar-On, I. Horikawa
Proceedings Volume 10959, 109592S (2019) https://doi.org/10.1117/12.2515233
KEYWORDS: Metrology, Critical dimension metrology, Process control, Scanning electron microscopy, Optical lithography, Algorithm development, Detection and tracking algorithms, Mathematical modeling, Image enhancement, Computer aided design

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