Metal halide perovskite solar cells have achieved efficiencies exceeding 26%, at par with crystalline Silicon. However, concerns of long-term stability and open questions about upscaled manufacturing persist. I will show how atomic layer deposition (ALD) can unlock further progress towards increased efficiency and long-term stability. Permeation barriers prepared by ALD as integral part of the device architecture suppress thermally driven decomposition of the perovskite and inhibit detrimental diffusion of halide species [1]. At the same time, ALD enables novel processing options for the preparation of semitransparent cells [2] and ultra-thin loss-less interconnects for tandem architectures [3] with the prospects to reach efficiency levels beyond 30% [4].
As ALD is originally a vacuum-based batch-processing technique, I will address the prospects of upscaling ALD for high-throughput manufacturing by the introduction of spatial ALD (S-ALD).
[1] K. O. Brinkmann et al., Nat. Comms. 2017, 8, 13938.
[2] T. Gahlmann et al., Adv. Energy Mater. 10, 1903.
[3] K. O. Brinkmann et al., Nature 604, 280 (2022).
[4] K.O. Brinkmann et al. Nat. Rev. Mater. DOI: 10.1038/s41578-023-00642-1.
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