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Greet Stoorms
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Publications (1)
Proceedings Article | 22 November 2023 Presentation
High-NA EUV platform realization as next step in EUV technology
Jara Garcia-Santaclara, Rudy Peeters, Jeroen van Dongen, Rob van Ballegoij, Sjoerd Lok, Jan van Schoot, Paul Graeupner, Peter Kuerz, Joerg Mallmann, Greet Stoorms, Peter Vanoppen
Proceedings Volume PC12750, PC1275002 (2023) https://doi.org/10.1117/12.2687756
KEYWORDS: Extreme ultraviolet, Yield improvement, Wafer-level optics, Semiconductors, Semiconducting wafers, Scanners, Reticles, Prototyping, Extreme ultraviolet lithography, Design and modelling
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