Dr. Hans K. Pulker Profile

Dr. Hans K. Pulker

at Univ Innsbruck

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 5 October 2005 Paper

Optical and mechanical properties of thin RLVIP Nb2O5-films

A. Hallbauer, D. Huber, H. Pulker

Proceedings Volume 5963, 59631F (2005) https://doi.org/10.1117/12.624851

KEYWORDS: Oxygen, Absorption, Refractive index, Niobium, Particles, Ions, Argon, Plasma, Heat treatments, Annealing

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Proceedings Article | 5 October 2005 Paper

Plasma monitoring of the RLVIP-process with a Langmuir probe

D. Huber, A. Hallbauer, H. Pulker

Proceedings Volume 5963, 59630G (2005) https://doi.org/10.1117/12.624856

KEYWORDS: Tantalum, Niobium, Plasma, Ions, Oxygen, Argon, Particles, Refractive index, Plating, Thin films

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Proceedings Article | 25 February 2004 Paper

Hans Pulker, Stefan Schlichtherle

Proceedings Volume 5250, (2004) https://doi.org/10.1117/12.513891

KEYWORDS: Oxygen, Refractive index, Absorption, Metals, Heat treatments, Oxides, Argon, Ions, Resistance, Atmospheric optics

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Proceedings Article | 4 November 1994 Paper

Thin film morphology in TEM as revealed by heat-shock fracturing and replication of film cross sections

Theo Mueller, Hans Pulker

Proceedings Volume 2253, (1994) https://doi.org/10.1117/12.192136

KEYWORDS: Coating, Glasses, Thin films, Transmission electron microscopy, Multilayers, Ions, Refractive index, Metals, Carbon, Chemical species

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Proceedings Article | 4 November 1994 Paper

Silicon- and aluminum-nitride films deposited by reactive low-voltage ion plating and reactive dc-magnetron sputtering

G. Vogl, K. Monz, Quang Nguyen, Michael Huter, Eduard Rille, Hans Pulker

Proceedings Volume 2253, (1994) https://doi.org/10.1117/12.192069

KEYWORDS: Silicon, Protactinium, Ions, Plating, Thin films, Aluminum, Nitrogen, Sputter deposition, Argon, Transmittance

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Proceedings Article | 1 December 1990 Paper

Roland Zarwasch, H. Oefner, Eduard Rille, Hans Pulker

Proceedings Volume 1324, (1990) https://doi.org/10.1117/12.22431

KEYWORDS: Sputter deposition, Thin films, Nitrogen, Refractive index, Aluminum, Transmission electron microscopy, Aluminum nitride, Coating, Argon, Crystals

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Proceedings Article | 1 December 1990 Paper

Ion currents and energies in reactive low-voltage ion plating: preliminary results

Johannes Edlinger, Hans Pulker

Proceedings Volume 1323, (1990) https://doi.org/10.1117/12.22369

KEYWORDS: Ions, Argon, Plasma, Thin films, Plating, Tantalum, Scanning electron microscopy, Lithium, Coating, Sensors

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Proceedings Article | 1 August 1990 Paper

Plasma- and ion-assisted PVD technologies for the production of hard optical coatings

Hans Pulker

Proceedings Volume 1275, (1990) https://doi.org/10.1117/12.20520

KEYWORDS: Ions, Sputter deposition, Plating, Coating, Plasma, Chemical species, Oxides, Ion beams, Metals, Refractive index

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Showing 5 of 8 publications

Proceedings Volume Editor (1)

SPIE Conference Volume | 27 February 1989

Thin Film Technologies III

Conference Committee Involvement (1)

Thin Film Technologies III

19 September 1988 | Hamburg, Germany

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