Dr. Hao Tang Profile

Dr. Hao Tang

Lithography Process Engineer at IBM Thomas J Watson Research Ctr

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 17 April 2020 Presentation + Paper

Dual tone sub-resolution assist features to improve corner rounding

Cheng Chi, Hao Tang, Oseo Park, Jing Xue, Jing Guo, Geng Han, Charlie King, Jeff Shearer, Sean Burns

Proceedings Volume 11327, 113270E (2020) https://doi.org/10.1117/12.2550834

KEYWORDS: SRAF, Photomasks, Semiconducting wafers, Optical proximity correction, Data modeling, Yield improvement, Optics manufacturing, Optical lithography, Deep ultraviolet, Logic

Read Abstract +

Proceedings Article | 24 March 2020 Presentation

Exploration of pillar local CDU improvement options for AI applications (Conference Presentation)

Chi-Chun Liu, Hao Tang, Yann Mignot, Ashim Dutta, Jennifer Church, Saumya Sharma, Dominik Metzler, Karen Petrillo, Michael Rizzolo, Luciana Meli, John Arnold, Nelson Felix

Proceedings Volume 11326, 113260W (2020) https://doi.org/10.1117/12.2552112

Read Abstract +

Proceedings Article | 21 March 2017 Presentation + Paper

Directed self-assembly patterning strategies for phase change memory applications

Robert Bruce, Gloria Fraczak, John Papalia, HsinYu Tsai, Matt BrightSky, Hiroyuki Miyazoe, Yu Zhu, Sebastian Engelmann, Hsiang-Lan Lung, Takeshi Masuda, Koukou Suu, Chi-Chun Liu, Hao Tang, John Arnold, Nelson Felix, Chung Lam

Proceedings Volume 10149, 101490J (2017) https://doi.org/10.1117/12.2257829

KEYWORDS: Plasma etching, Etching, Chalcogenides, Atomic layer deposition, Dry etching, Directed self assembly, Reactive ion etching, Picosecond phenomena, Polymethylmethacrylate, Scanning electron microscopy, Critical dimension metrology

Read Abstract +

Proceedings Article | 18 March 2016 Paper

EUV patterning successes and frontiers

Nelson Felix, Dan Corliss, Karen Petrillo, Nicole Saulnier, Yongan Xu, Luciana Meli, Hao Tang, Anuja De Silva, Bassem Hamieh, Martin Burkhardt, Yann Mignot, Richard Johnson, Chris Robinson, Mary Breton, Indira Seshadri, Derren Dunn, Stuart Sieg, Eric Miller, Genevieve Beique, Andre Labonte, Lei Sun, Geng Han, Erik Verduijn, Eunshoo Han, Bong Cheol Kim, Jongsu Kim, Koichi Hontake, Lior Huli, Corey Lemley, Dave Hetzer, Shinichiro Kawakami, Koichi Matsunaga

Proceedings Volume 9776, 97761O (2016) https://doi.org/10.1117/12.2219894

KEYWORDS: Extreme ultraviolet, Optical lithography, Lithography, Extreme ultraviolet lithography, Oxides, Neodymium, Ions, Etching

Read Abstract +

Proceedings Article | 18 March 2016 Paper

Comparison of left and right side line edge roughness in lithography

Lei Sun, Nicole Saulnier, Genevieve Beique, Erik Verduijn, Wenhui Wang, Yongan Xu, Hao Tang, Yulu Chen, Ryoung-han Kim, John Arnold, Nelson Felix, Matthew Colburn

Proceedings Volume 9778, 977822 (2016) https://doi.org/10.1117/12.2219665

KEYWORDS: Line edge roughness, Metrology, Lithography, Etching, Semiconductors, Scattering, Inspection, Critical dimension metrology, Photomasks, Roads, Extreme ultraviolet lithography

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years