Dr. Harald Bosse Profile

Dr. Harald Bosse

Head of Dept 5.2 at Physikalisch-Technische Bundesanstalt

SPIE Involvement:

Conference Program Committee | Author

Publications (41)

SPIE Journal Paper | 30 March 2016

Two approaches for realizing traceability in nanoscale dimensional metrology

Gaoliang Dai, Ludger Koenders, Jens Flügge, Harald Bosse

OE, Vol. 55, Issue 09, 091407, (March 2016) https://doi.org/10.1117/12.10.1117/1.OE.55.9.091407

KEYWORDS: Calibration, Metrology, Crystals, Dimensional metrology, Nanostructures, Interferometers, Silicon, Transmission electron microscopy, X-ray optics, Atomic force microscopy

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Proceedings Article | 2 November 2015 Paper

Photomask linewidth comparison by PTB and NIST

D. Bergmann, B. Bodermann, H. Bosse, E. Buhr, G. Dai, R. Dixson, W. Häßler-Grohne, K. Hahm, M. Wurm

Proceedings Volume 9636, 96360S (2015) https://doi.org/10.1117/12.2199453

KEYWORDS: Photomasks, Metrology, Critical dimension metrology, Microscopes, Manufacturing, Standards development, Data modeling, Dimensional metrology, Scanning electron microscopy, Line width roughness, Opacity, Calibration, Atomic force microscopy

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SPIE Journal Paper | 22 May 2014

Improved measurement performance of the Physikalisch-Technische Bundesanstalt nanometer comparator by integration of a new Zerodur sample carriage

Jens Flügge, Rainer Köning, Eugen Schötka, Christoph Weichert, Paul Köchert, Harald Bosse, Horst Kunzmann

OE, Vol. 53, Issue 12, 122404, (May 2014) https://doi.org/10.1117/12.10.1117/1.OE.53.12.122404

KEYWORDS: Interferometers, Zerodur, Computer programming, Photomasks, Calibration, Metrology, Mirrors, Manufacturing, Microscopes

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Proceedings Article | 10 October 2013 Paper

Traceability of measurements at the nanoscale

Harald Bosse

Proceedings Volume 8916, 891603 (2013) https://doi.org/10.1117/12.2035957

KEYWORDS: Nanoparticles, Metrology, Nanotechnology, Particles, Scanning probe microscopy, Diffraction, Manufacturing, Extreme ultraviolet, Scanning electron microscopy, Nanostructures

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Proceedings Article | 13 May 2013 Paper

The road towards accurate optical width measurements at the industrial level

Bernd Bodermann, Rainer Köning, Detlef Bergmann, Egbert Buhr, Wolfgang Hässler-Grohne, Jens Flügge, Harald Bosse

Proceedings Volume 8788, 87881S (2013) https://doi.org/10.1117/12.2021888

KEYWORDS: Calibration, Optical testing, Microscopes, Imaging systems, Edge roughness, Metrology, Objectives, Photomasks, Geometrical optics, Diffraction

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SPIE Journal Paper | 29 February 2012

New developments at Physikalisch Technische Bundesanstalt in three-dimensional atomic force microscopy with tapping and torsion atomic force microscopy mode and vector approach probing strategy

Gaoliang Dai, Wolfgang Hässler-Grohne, Dorothee Hueser, Helmut Wolff, Jens Flügge, Harald Bosse

JM3, Vol. 11, Issue 1, 011004, (February 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.1.011004

KEYWORDS: Atomic force microscopy, 3D metrology, Critical dimension metrology, Metrology, Digital signal processing, Photomasks, Calibration, Signal processing, Signal detection, Line width roughness

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Proceedings Article | 10 June 2011 Paper

New developments at PTB in 3D-AFM with tapping and torsion AFM mode and vector approach probing strategy

G. Dai, W. Hässler-Grohne, D. Hüser, H. Wolff, J. Fluegge, H. Bosse

Proceedings Volume 8036, 80360V (2011) https://doi.org/10.1117/12.884657

KEYWORDS: Atomic force microscopy, 3D metrology, Critical dimension metrology, Digital signal processing, Photomasks, Metrology, Calibration, Line width roughness, Signal processing, Crystals

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Proceedings Article | 31 December 2010 Paper

Measurement in precision engineering

H. Bosse

Proceedings Volume 7544, 754453 (2010) https://doi.org/10.1117/12.885231

KEYWORDS: Metrology, Manufacturing, Standards development, Calibration, Scanning probe microscopy, Photomasks, Control systems, Semiconducting wafers, Precision measurement, Prototyping

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Proceedings Article | 3 April 2010 Paper

Monte Carlo modeling of BSE reflection in e-beam writers

H. Alves, K.-P. Johnsen, P. Hahmann, D. Gnieser, C. Frase, H. Bosse

Proceedings Volume 7637, 76371T (2010) https://doi.org/10.1117/12.846517

KEYWORDS: Reflection, Silicon, Teeth, Monte Carlo methods, Semiconducting wafers, Electron beams, Sensors, Objectives, Lithography, Critical dimension metrology

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Proceedings Article | 2 April 2010 Paper

SEM image modeling using the modular Monte Carlo model MCSEM

K.-P. Johnsen, C. Frase, H. Bosse, D. Gnieser

Proceedings Volume 7638, 76381O (2010) https://doi.org/10.1117/12.846543

KEYWORDS: Monte Carlo methods, Scanning electron microscopy, Chromium, 3D modeling, Sensors, Silica, Scattering, Image acquisition, Electron beams, Photomasks

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Proceedings Article | 2 April 2010 Paper

Comparison of different algorithms to determine areas from SEM images

K.-P. Johnsen, C. Frase, H. Bosse, I. Yonekura, M. Higuchi, J. Richter

Proceedings Volume 7638, 76382Q (2010) https://doi.org/10.1117/12.846536

KEYWORDS: Scanning electron microscopy, Monte Carlo methods, Edge detection, Detection and tracking algorithms, Image processing, Photomasks, Image filtering, Algorithm development, Printing, 3D image processing

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We present a comparison of different methods to extract area information from images. Two different physical-based algorithms were tested which determine the areas of arbitrarily shaped 3D nano-structures on wafers or photo-masks (e.g. contact holes) using secondary electron images of scanning electron microscopy (SEM). One of these algorithms, called NANOAREA, was developed by the PTB. The other one is the software package MaskEXPRESS, which was developed by Toppan Printing Co., Ltd. In addition to real SEM images we used Monte Carlo generated SEM images of contact holes of different shapes and sizes. For this, the Monte Carlo simulation program MCSEM, developed at PTB, was applied. MCSEM simulates the electron diffusion and secondary electron generation and transport in solid state material and provides simulated SEM images of arbitrary 3D specimen structures. NANOAREA uses basic image processing routines to estimate the edge position of a structure. Then, one-dimensional profiles which intersect the structure boundary perpendicularly are extracted. A one-dimensional edge detection algorithm determines the edge position on each profile. Finally these detected edge positions are used to calculate the polygon area using the triangle method. NANOAREA showed a very small underestimation of the area of about 0.3 % with regard to the Monte Carlo simulations (i.e. sub-pixel deviation). MaskEXPRESS has a similar approach, however employs a different edge detection algorithm. For quadratic contact holes a very high correlation coefficient r larger than 0.99 of the CDs was seen with an offset of about 0.3 nm for the two tested programs. Here the critical dimension (CD) is defined as the square root of the area. The deviations from the mean offset were smaller than 1 nm over the whole investigated range. For analysis of arbitrarily shaped features we used a double T-shaped structure. Also here almost perfect correlation was found (r = 0.98). The observed mean offset in this case was also about 0.3 nm. The offsets depend on the length of the edge and can vary with the shape of the structure, too. Here we report the excellent correlation of the investigated algorithms and programs to determine area parameters from SEM images. The results found are an important prerequisite for harmonized area measurement based on independent algorithms and pave the way to a standardized approach to area determination and reporting of photomask structures.

Proceedings Article | 23 September 2009 Paper

Results of an international photomask linewidth comparison of NIST and PTB

B. Bodermann, D. Bergmann, E. Buhr, W. Hässler-Grohne, H. Bosse, J. Potzick, R. Dixson, R. Quintanilha, M. Stocker, A. Vladar, N. Orji

Proceedings Volume 7488, 74881H (2009) https://doi.org/10.1117/12.831373

KEYWORDS: Photomasks, Scanning electron microscopy, Standards development, Metrology, Ultraviolet radiation, Microscopes, Atomic force microscopy, Calibration, Critical dimension metrology, Microscopy

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Proceedings Article | 27 May 2009 Paper

SEM image contrast modeling for mask and wafer metrology

C. Frase, D. Gnieser, K.-P. Johnsen, W. Häßler-Grohne, R. Tutsch, H. Bosse

Proceedings Volume 7470, 74700M (2009) https://doi.org/10.1117/12.835184

KEYWORDS: Monte Carlo methods, Scanning electron microscopy, Photomasks, Scattering, 3D modeling, Semiconducting wafers, Metrology, Optical simulations, Electron beams, Sensors

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Proceedings Article | 18 March 2009 Paper

Optimization of BSE-detector for e-beam direct write lithography

H. Alves, P. Hahmann, M. Slodowski, C. Frase, D. Gnieser, Klaus-Peter Johnsen, H. Bosse

Proceedings Volume 7271, 72712O (2009) https://doi.org/10.1117/12.814156

KEYWORDS: Sensors, Signal to noise ratio, Monte Carlo methods, Signal detection, Lithography, Etching, Scattering, Electron beams, Direct write lithography, Vestigial sideband modulation

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Proceedings Article | 12 January 2009 Paper

Interferometry at the PTB Nanometer Comparator: design, status and development

J. Flügge, Ch. Weichert, H. Hu, R. Köning, H. Bosse, A. Wiegmann, M. Schulz, C. Elster, R. Geckeler

Proceedings Volume 7133, 713346 (2009) https://doi.org/10.1117/12.821252

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Proceedings Article | 17 October 2008 Paper

International photomask linewidth comparison by NIST and PTB

J. Potzick, R. Dixson, R. Quintanilha, M. Stocker, A. Vladar, E. Buhr, W. Häßler-Grohne, B. Bodermann, C. G. Frase, H. Bosse

Proceedings Volume 7122, 71222P (2008) https://doi.org/10.1117/12.801435

KEYWORDS: Photomasks, Metrology, Scanning electron microscopy, Calibration, Microscopes, Chromium, Ultraviolet radiation, Standards development, Critical dimension metrology, Interferometers

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Proceedings Article | 17 October 2008 Paper

Development of a 1.5D reference comparator for position and straightness metrology on photomasks

J. Flügge, R. Köning, Ch. Weichert, W. Häßler-Grohne, R. Geckeler, A. Wiegmann, M. Schulz, C. Elster, H. Bosse

Proceedings Volume 7122, 71222Y (2008) https://doi.org/10.1117/12.801251

KEYWORDS: Interferometers, Photomasks, Metrology, Mirrors, Computer programming, Calibration, Sensors, Microscopes, Beam splitters, Image registration

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Proceedings Article | 2 May 2008 Paper

Influences on accuracy of SEM based CD mask metrology with a view to the 32 nm node

W. Häßler-Grohne, C. Frase, D. Gnieser, H. Bosse, J. Richter, A. Wiswesser

Proceedings Volume 6792, 67920O (2008) https://doi.org/10.1117/12.798783

KEYWORDS: Photomasks, Scanning electron microscopy, Critical dimension metrology, Electrons, Monte Carlo methods, Calibration, Metrology, Silicon, Diffusion, Line edge roughness

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Proceedings Article | 26 March 2008 Paper

E-beam direct write alignment strategies for the next generation node

H. Alves, P. Hahmann, K.-H. Kliem, U. Weidenmueller, S. Jahr, C. Frase, D. Gnieser, H. Bosse, R. Zimmermann, C. Arndt

Proceedings Volume 6921, 69210I (2008) https://doi.org/10.1117/12.771585

KEYWORDS: Optical alignment, Monte Carlo methods, Sensors, Silicon, Signal to noise ratio, Signal detection, Semiconducting wafers, Vestigial sideband modulation, Electron beam direct write lithography, Lithography

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Proceedings Article | 18 June 2007 Paper

An approach to validation of rigorous modeling in optical CD microscopy by comparison of measurement results with independent methods

B. Bodermann, H. Bosse

Proceedings Volume 6617, 66170Y (2007) https://doi.org/10.1117/12.728896

KEYWORDS: Photomasks, Scanning electron microscopy, Critical dimension metrology, Microscopy, Ultraviolet radiation, Monte Carlo methods, Opacity, Calibration, Atomic force microscopy, Microscopes

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Proceedings Article | 3 May 2007 Paper

Calibration of CD mask standards for the 65-nm node: CoG and MoSi

J. Richter, T. Heins, R. Liebe, B. Bodermann, A. Diener, D. Bergmann, C. Frase, H. Bosse

Proceedings Volume 6533, 65330S (2007) https://doi.org/10.1117/12.736931

KEYWORDS: Critical dimension metrology, Scanning electron microscopy, Photomasks, Calibration, Ultraviolet radiation, Microscopy, Atomic force microscopy, Standards development, Opacity, Metrology

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Proceedings Article | 5 April 2007 Paper

Achievement of sub nanometer reproducibility in line scale measurements with the nanometer comparator

Rainer Köning, Jens Flügge, Harald Bosse

Proceedings Volume 6518, 65183F (2007) https://doi.org/10.1117/12.712121

KEYWORDS: Microscopes, Interferometers, Sensors, Metrology, Optical microscopes, Mirrors, Reflectors, Computer programming, Optical alignment, Calibration

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Proceedings Article | 5 April 2007 Paper

A new SEM CD operator verified against Monte Carlo simulations

C. Frase, D. Gnieser, K. Dirscherl, E. Buhr, H. Bosse

Proceedings Volume 6518, 65184P (2007) https://doi.org/10.1117/12.712503

KEYWORDS: Monte Carlo methods, Scanning electron microscopy, Critical dimension metrology, Computer simulations, Image acquisition, Scattering, Optical simulations, Electron beams, Convolution, Metrology

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Proceedings Article | 5 April 2007 Paper

Aspects and new developments on edge angle and edge profile metrology at PTB

Bernd Bodermann, Egbert Buhr, Alexander Diener, Kai Dirscherl, Gerd Ehret, Carl Georg Frase, Matthias Wurm

Proceedings Volume 6518, 65181X (2007) https://doi.org/10.1117/12.712137

KEYWORDS: Scanning electron microscopy, Metrology, Scatterometry, Atomic force microscopy, Photomasks, Sensors, Critical dimension metrology, Scatter measurement, Silicon, Polarization

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Proceedings Article | 21 June 2006 Paper

Systematic investigation of CD metrology tool response to sidewall profile variation on a COG test mask

F. Gans, R. Liebe, Th. Heins, J. Richter, W. Häβler-Grohne, C. Frase, B. Bodermann, S. Czerkas, K. Dirscherl, H. Bosse

Proceedings Volume 6281, 62810D (2006) https://doi.org/10.1117/12.692736

KEYWORDS: Scanning probe microscopy, Scanning electron microscopy, Critical dimension metrology, Photomasks, Ultraviolet radiation, Metrology, Microscopy, Opacity, Electrons, Etching

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Proceedings Article | 21 June 2006 Paper

Calibration of test masks used for lithography lens systems

M. Arnz, W. Häβler-Grohne, B. Bodermann, H. Bosse

Proceedings Volume 6281, 62810C (2006) https://doi.org/10.1117/12.692735

KEYWORDS: Photomasks, Calibration, Lithography, Optical design, Modulation transfer functions, Metrology, Critical dimension metrology, Scanning electron microscopy, Semiconducting wafers, Distortion

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Proceedings Article | 9 November 2005 Paper

Calibration procedures and application of the PTB photomask CD standard

W. Häßler-Grohne, C.G. Frase, S. Czerkas, K. Dirscherl, B. Bodermann, W. Mirandé, G. Ehret, H. Bosse

Proceedings Volume 5992, 59924O (2005) https://doi.org/10.1117/12.632779

KEYWORDS: Calibration, Ultraviolet radiation, Photomasks, Scanning electron microscopy, Critical dimension metrology, Microscopy, Deep ultraviolet, Standards development, Chromium, Opacity

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Proceedings Article | 18 August 2005 Paper

Characterising the performance of the PTB line scale interferometer by measuring photoelectric incremental encoders

Rainer Koening, Jens Fluegge, Harald Bosse

Proceedings Volume 5879, 587908 (2005) https://doi.org/10.1117/12.616332

KEYWORDS: Interferometers, Computer programming, Head, Laser induced plasma spectroscopy, Reflectors, Interference (communication), Sensors, Zerodur, Calibration, Vibration isolation

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Proceedings Article | 16 June 2005 Paper

Results of a round robin measurement on a new CD mask standard

F. Gans, R. Liebe, J. Richter, Th. Schatz, B. Hauffe, F. Hillmann, S. Dobereiner, H.-J. Bruck, G. Scheuring, B. Brendel, L. Bettin, K.-D. Roth, W. Steinberg, G. Schluter, P. Speckbacher, W. Sedlmeier, T. Scherubl, W. Hassler-Grohne, C. Frase, S. Czerkas, K. Dirscherl, B. Bodermann, W. Mirande, H. Bosse

Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637313

KEYWORDS: Calibration, Photomasks, Ultraviolet radiation, Scanning electron microscopy, Standards development, Critical dimension metrology, Deep ultraviolet, Chromium, Microscopy, Opacity

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Proceedings Article | 10 May 2005 Paper

Impact of EUV mask pattern profile shape on CD measured by CD-SEM

Uwe Dersch, Arnd Korn, Cornelia Engelmann, Carl Frase, Wolfgang Haessler-Grohne, Harald Bosse, Florian Letzkus, Joerg Butschke

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.598644

KEYWORDS: Critical dimension metrology, Scanning electron microscopy, Monte Carlo methods, Extreme ultraviolet, Photomasks, Detection and tracking algorithms, Silicon, Electron beams, Extreme ultraviolet lithography, Signal detection

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Proceedings Article | 2 June 2004 Paper

Metrological characterization of new CD photomask standards

Werner Mirande, Bernd Bodermann, W. Haessler-Grohne, Carl Frase, Slawomir Czerkas, Harald Bosse

Proceedings Volume 5504, (2004) https://doi.org/10.1117/12.568020

KEYWORDS: Critical dimension metrology, Scanning electron microscopy, Standards development, Calibration, Photomasks, Chromium, Atomic force microscopy, Microscopy, Microscopes, Ultraviolet radiation

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Proceedings Article | 24 May 2004 Paper

Characterization of a 100-nm 1D pitch standard by metrological SEM and SFM

Wolfgang Haessler-Grohne, Thorsten Dziomba, Carl Frase, Harald Bosse, Jerry Prochazka

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.536285

KEYWORDS: Scanning electron microscopy, Atomic force microscopy, Calibration, Line edge roughness, Metrology, Interferometers, Microscopes, Phase shifts, Very large scale integration, Electron microscopes

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Proceedings Article | 24 May 2004 Paper

Characterization of new CD photomask standards

Werner Mirande, Bernd Bodermann, Wolfgang Haessler-Grohne, Carl Frase, Slawomir Czerkas, Harald Bosse

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.533734

KEYWORDS: Critical dimension metrology, Scanning electron microscopy, Photomasks, Calibration, Standards development, Chromium, Monte Carlo methods, Microscopy, Atomic force microscopy, Opacity

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Proceedings Article | 20 November 2003 Paper

Line scale comparison Nano3

Harald Bosse, Wolfgang Haessler-Grohne, Jens Fluegge, Rainer Koening

Proceedings Volume 5190, (2003) https://doi.org/10.1117/12.506894

KEYWORDS: Metrology, Zerodur, Quartz

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Proceedings Article | 20 November 2003 Paper

Recent activities at PTB nanometer comparator

Jens Flugge, Rainer Koning, Harald Bosse

Proceedings Volume 5190, (2003) https://doi.org/10.1117/12.506908

KEYWORDS: Interferometers, Computer programming, Optical fibers, Microscopes, Optical microscopes, Calibration, Head, Metals, Bridges

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Proceedings Article | 28 May 2003 Paper

Development and characterization of new CD mask standards: a status report

Thomas Schatz, Bertram Hauffe, Stefan Dobereiner, Hans-Jurgen Bruck, Bernd Brendel, Lutz Bettin, Klaus-Dieter Roth, Walter Steinberg, Peter Speckbacher, Wolfgang Sedlmeier, Thomas Engel, Wolfgang Hassler-Grohne, Werner Mirande, Harald Bosse

Proceedings Volume 5148, (2003) https://doi.org/10.1117/12.514952

KEYWORDS: Photomasks, Prototyping, Metrology, Standards development, Atomic force microscopy, Calibration, Line edge roughness, Critical dimension metrology, Chromium, Opacity

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Proceedings Article | 16 August 2002 Paper

Calibration of test reticles for qualification of imaging properties of microlithographic projection lenses

Wolfgang Haessler-Grohne, K Hahm, Werner Mirande, Harald Bosse, Michael Arnz

Proceedings Volume 4764, (2002) https://doi.org/10.1117/12.479346

KEYWORDS: Calibration, Reticles, Scanning electron microscopy, Chromium, Optical microscopy, Lenses, Transmittance, Contamination, Microscopy, Opacity

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Proceedings Article | 9 April 2001 Paper

Comparison of linewidth measurements on COG masks

Harald Bosse, Werner Mirande, Carl Frase, Hans-Juergen Brueck, Sigrid Lehnigk

Proceedings Volume 4349, (2001) https://doi.org/10.1117/12.425082

KEYWORDS: Scanning electron microscopy, Photomasks, Critical dimension metrology, Chromium, Optical microscopy, Optical testing, Transmittance, Quartz, Microscopy, Adaptive optics

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Proceedings Article | 30 December 1999 Paper

Traceability, reproducibility, and comparability of grid calibrations

Harald Bosse, Wolfgang Haessler-Grohne, Bernd Brendel

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373342

KEYWORDS: Calibration, Photomasks, Metrology, Lithography, Microsystems, Tolerancing, Zerodur, Edge roughness, Optical lithography, Error analysis

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Proceedings Article | 1 September 1998 Paper

Current activities in mask metrology at the PTB

Wolfgang Hassler-Grohne, Harald Bosse

Proceedings Volume 3412, (1998) https://doi.org/10.1117/12.328851

KEYWORDS: Calibration, Interferometry, Interferometers, Temperature metrology, Metrology, Scanning electron microscopy, Edge detection, Photomasks, Contamination, Refractive index

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Proceedings Article | 12 February 1997 Paper

New electron microscope system for pattern placement metrology

Harald Bosse, Wolfgang Haessler-Grohne

Proceedings Volume 3236, (1997) https://doi.org/10.1117/12.301186

KEYWORDS: Photomasks, Scanning electron microscopy, Metrology, Electron microscopes, Edge detection, Calibration, Interferometers, X-rays, Interferometry, Electron beams

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Showing 5 of 41 publications

Proceedings Volume Editor (4)

SPIE Conference Volume | 27 February 2015

Ninth International Symposium on Precision Engineering Measurement and Instrumentation

SPIE Conference Volume | 23 May 2011

Modeling Aspects in Optical Metrology III

SPIE Conference Volume | 17 June 2009

Modeling Aspects in Optical Metrology II

SPIE Conference Volume | 18 June 2007

Modeling Aspects in Optical Metrology

Conference Committee Involvement (22)

Optical Measurement Systems for Industrial Inspection XIV

23 June 2025 | Munich, Germany

Optical Instrument Science, Technology, and Applications III

10 April 2024 | Strasbourg, France

Optical Measurement Systems for Industrial Inspection XIII

26 June 2023 | Munich, Germany

Optical Instrument Science, Technology, and Applications II

13 September 2021 | Online Only, Spain

Optical Measurement Systems for Industrial Inspection XII

21 June 2021 | Online Only, Germany

Optical Measurement Systems for Industrial Inspection XI

24 June 2019 | Munich, Germany

Optical Instrument Science, Technology, and Applications

14 May 2018 | Frankfurt, Germany

Modeling Aspects in Optical Metrology

26 June 2017 | Munich, Germany

Optical Measurement Systems for Industrial Inspection X

26 June 2017 | Munich, Germany

Modeling Aspects in Optical Metrology V

23 June 2015 | Munich, Germany

Optical Measurement Systems for Industrial Inspection IX

22 June 2015 | Munich, Germany

International Symposium on Precision Engineering Measurement and Instrumentation 2014

8 August 2014 | Changsha/Zhangjiajie, China

Optical Measurement Systems for Industrial Inspection VIII

13 May 2013 | Munich, Germany

Modeling Aspects in Optical Metrology IV

13 May 2013 | Munich, Germany

Optical Measurement Systems for Industrial Inspection

23 May 2011 | Munich, Germany

Modeling Aspects in Optical Metrology

23 May 2011 | Munich, Germany

Optical Measurement Systems for Industrial Inspection

16 June 2009 | Munich, Germany

Modeling Aspects in Optical Metrology

15 June 2009 | Munich, Germany

Optical Measurement Systems for Industrial Inspection

18 June 2007 | Munich, Germany

Modeling Aspects in Optical Metrology

18 June 2007 | Munich, Germany

Recent Developments in Traceable Dimensional Measurements III

31 July 2005 | San Diego, California, United States

Recent Developments in Traceable Dimensional Measurements II

4 August 2003 | San Diego, California, United States

Showing 5 of 22 Conference Committees

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