Mr. Hiroie Matsumoto Profile

Hiroie Matsumoto

at TEL Technology Ctr America LLC

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 20 March 2015 Paper

Evaluation of novel processing approaches to improve extreme ultraviolet (EUV) photoresist pattern quality

Cecilia Montgomery, Jun Sung Chun, Yu-Jen Fan, Shih-Hui Jen, Mark Neisser, Kevin Cummings, Warren Montgomery, Takashi Saito, Lior Huli, David Hetzer, Hiroie Matsumoto, Andrew Metz, Vinayak Rastogi

Proceedings Volume 9425, 942526 (2015) https://doi.org/10.1117/12.2086982

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Etching, Photoresist processing, Line width roughness, Photoresist materials, Lithography, Optical lithography, Critical dimension metrology, Double patterning technology

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Proceedings Article | 20 March 2015 Paper

Coater/developer process integration of metal-oxide based photoresist

Benjamin Clark, Michael Kocsis, Michael Greer, Andrew Grenville, Takashi Saito, Lior Huli, Richard Farrell, David Hetzer, Shan Hu, Hiroie Matsumoto, Andrew Metz, Shinchiro Kawakami, Koichi Matsunaga, Masashi Enomoto, Jeffrey Lauerhaas, Anthony Ratkovich, David DeKraker

Proceedings Volume 9425, 94251A (2015) https://doi.org/10.1117/12.2085982

KEYWORDS: Photoresist materials, Metals, Etching, Semiconducting wafers, Contamination, Tin, Thin film coatings, Extreme ultraviolet lithography, Oxides, Photoresist developing

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Proceedings Article | 17 March 2015 Paper

Trench and hole patterning with EUV resists using dual frequency capacitively coupled plasma (CCP)

Yannick Feurprier, Katie Lutker-Lee, Vinayak Rastogi, Hiroie Matsumoto, Yuki Chiba, Andrew Metz, Kaushik Kumar, Genevieve Beique, Andre Labonte, Cathy Labelle, Yann Mignot, Bassem Hamieh, John Arnold

Proceedings Volume 9428, 94280F (2015) https://doi.org/10.1117/12.2086519

KEYWORDS: Etching, Optical lithography, Extreme ultraviolet, Plasma, Plasma etching, Photomasks, Photoresist processing, Line edge roughness, Line width roughness, Extreme ultraviolet lithography

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Proceedings Article | 13 March 2015 Paper

Towards production ready processing with a state-of-the-art EUV cluster

Karen Petrillo, Nicole Saulnier, Richard Johnson, Luciana Meli, Chris Robinson, Chiew-seng Koay, Nelson Felix, Daniel Corliss, Matthew Colburn, Takashi Saito, Lior Huli, David Hetzer, Hiroie Matsumoto, Andrew Metz, Yudai Hira

Proceedings Volume 9422, 94220R (2015) https://doi.org/10.1117/12.2085894

KEYWORDS: Extreme ultraviolet, Optical lithography, Extreme ultraviolet lithography, Inspection, Critical dimension metrology, Lithography, Wafer inspection, Semiconducting wafers, Carbon, Signal processing

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