Ms. Hye Rim Ji Profile

Hye Rim Ji

Application Engineer at Carl Zeiss Co Ltd

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Publications (1)

Proceedings Article | 9 July 2015 Paper

Patterning dependence on the mask defect for extreme ultraviolet lithography

Hye-Rim Ji, In-Seon Kim, Guk-Jin Kim, Jin-Goo Park, Min-Su Kim, Micheal Yeung, Eytan Barouch, Hye-Keun Oh

Proceedings Volume 9658, 965813 (2015) https://doi.org/10.1117/12.2197751

KEYWORDS: Photomasks, Critical dimension metrology, Particles, Extreme ultraviolet lithography, Mass attenuation coefficient, Optical lithography, Iron, Aluminum, Metals, Extreme ultraviolet

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